Photocurable composition, pattern forming method, and method for manufacturing device
申请人:FUJIFILM Corporation
公开号:US10739678B2
公开(公告)日:2020-08-11
Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (ΔLWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R1 represents a hydrogen atom or a methyl group; R2 represents an alkyl group which may be substituted with a fluorine atom, R3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R4 to R8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R2 and R3 is 1 to 6, and R2 and R3, or R2 and R4 may be bonded to each other and form a ring.
本发明提供了一种能够同时抑制蚀刻后图案变形(线宽粗糙度(ΔLWR)的变化)和蚀刻后图案破损的光固化组合物、一种图案形成方法和一种制造设备的方法。本发明公开了一种光固化组合物,该组合物包括由下式(I)表示的单官能团(甲基)丙烯酸酯和光聚合引发剂,其中 R1 代表氢原子或甲基;R2 代表可被氟原子取代的烷基,R3 代表氢原子、可被氟原子取代的直链烷基或可被氟原子取代的支链烷基,R4 至 R8 各自独立地代表氢原子、卤素原子、具有 1 至 4 个碳原子的直链烷基或具有 3 或 4 个碳原子的支链烷基,R2 和 R3 中包含的碳原子总数为 1 至 6,且 R2 和 R3 或 R2 和 R4 可相互键合并形成环。