Spectroscopy of Hydrothermal Reactions 22. The Effects of Cations on the Decarboxylation Kinetics of Trifluoroacetate, Cyanoacetate, Propiolate, and Malonate Ions
作者:Davide Miksa、Jun Li、Thomas B. Brill
DOI:10.1021/jp020941t
日期:2002.11.21
The effect of Group 1 counterions on the decarboxylation rate of four carboxylate ions (trifluoroacetate, propiolate, cyanoacetate, and malonate) was determined in water at 140-280 degreesC and 275 bar. The decarboxylation kinetics were determined in real time by using IR spectroscopy and a titanium cell flow-reactor with sapphire windows. The complexity of the reaction of CF3CO2- necessitated additional postreaction studies by H-1 and F-19 NMR spectroscopy and F- ion electrochemistry. Batch mode reactions in a titanium tube reactor were employed for the latter studies. The CF3H product of CF3CO2- decomposed, liberating F- ions. The cation effect for CF3CO2- is caused primarily by the reaction of F- with the. Group I cations in the order Li+ > Na+ > K+..., which changed the ionic strength. The rate of decarboxylation of cyanoacetate was unaffected by the cation, whereas the Li+ ion slowed the rate of decarboxylation of propiolate, perhaps because of complexation with propiolate. These results were compared with the previously investigated malonate system. Where a cation effect was observed, the effect could be attributed to some form of ion pairing, but in each case the details of the interaction differ slightly.
[EN] LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AND/OR MAKING SEMICONDUCTOR DEVICES<br/>[FR] COMPOSITIONS DE LITHOGRAPHIE ET PROCÉDÉS DE FORMATION DE MOTIFS DE RÉSINE PHOTOSENSIBLE ET/OU DE FABRICATION DE DISPOSITIFS À SEMI-CONDUCTEUR
申请人:[en]THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK
公开号:WO2023158848A2
公开(公告)日:2023-08-24
The present disclosure relates to compounds and use thereof as film or lithographic compositions such as EUV photoresist films. More particularly, embodiments of the disclosure provide lithography compositions and methods of depositing radiation sensitive films, which can be used for patterning applications with UV light, EUV light or electron-beam radiation to form high resolution patterns with low line width roughness. In embodiments, novel ligands are provided for forming radiation sensitive film compositions.
Facile Decarboxylation of Propiolic Acid on a Ruthenium Center and Related Chemistry
作者:John H. Bowie、Michael I. Bruce、Mark A. Buntine、Alexander S. Gentleman、David C. Graham、Paul J. Low、Gregory F. Metha、Cassandra Mitchell、Christian R. Parker、Brian W. Skelton、Allan H. White
DOI:10.1021/om300157w
日期:2012.8.13
corresponding alkynyls. Attempted deprotonation of [Ru(═C═CH2)(dppe)Cp]+ with LiBu gave the binuclear cyclobutenylidinium complex [Ru(dppe)Cp}2(μ-C4H3)]+. The X-ray diffraction molecular structures of [Ru(dppe)Cp}2(μ-C4H3)]PF6 (11), [Ru═C(OMe)CH2(CO2Me)}(dppe)Cp]PF6 (13), RuC(OMe)═CH(CO2R)}(dppe)Cp (R ═ Me (15), Et (16)) and Ru(C≡CCO2R)(dppe)Cp (R = Me (21), Et (22)) are described.