2-丙烯酸,2-甲基-,1-(2-甲基丙氧基)乙基酯 | 138554-09-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 2-丙烯酸,2-甲基-,1-(2-甲基丙氧基)乙基酯
• 英文名称: 1-isobutoxy-1-ethyl methacrylate
• 英文别名: 1-(2-Methylpropoxy)ethyl 2-methylprop-2-enoate
• CAS: 138554-09-3
• 化学式: C₁₀H₁₈O₃
• 分子量: 186.251
• InChiKey: XIKOSBCHVLVLIE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  13
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 乙烯基异丁醚 、 氟 在 Sodium sulfate-III 、 carboxyl 作用下， 以 碳酸氢钠 为溶剂， 40.0~60.0 ℃ 、399.97 kPa 条件下， 反应 6.0h， 以By this, 12.32 g of 1-(2-methylpropoxy)ethyl methacrylate of the following formula was obtained in the form of a pale yellow liquid as a protected carboxyl-的产率得到2-丙烯酸,2-甲基-,1-(2-甲基丙氧基)乙基酯
  参考文献：
  名称：

  Positive-type resist composition

  摘要：

  根据本发明，一种正型光刻胶组合物包括含氟脂肪醇、聚合物、乙烯基化合物和光酸发生剂，其中所述含氟脂肪醇是一种单元C2-C8脂肪醇，其中氢原子的数量等于或小于氟原子的数量。这种正型光刻胶组合物对有机材料的影响很小，例如对有机材料的溶解和肿胀较少，并且可以通过湿法应用工艺在有机聚合物基板上形成光刻胶膜等，从而得到的光刻胶膜或光刻胶图案具有高溶剂抵抗性。

  公开号：

  US09310682B2

文献信息

• PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20130171415A1

  公开（公告）日：2013-07-04

  Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar 1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R 2 s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.

  揭示了一种光敏树脂组合物，包括：（组分A）由式（1）表示的肟磺酸盐化合物；（组分B）包括具有可被酸分解的基团的树脂，该基团通过酸分解形成羧基或酚羟基；和（组分C）溶剂 其中在式（1）中，R1表示烷基、芳基或杂芳基，每个R2独立地表示氢原子、烷基、芳基或卤素原子，Ar1表示邻芳撑基或邻杂芳撑基，X表示O或S，n表示1或2，前提是在化合物中存在两个或两个以上的R2时，至少有一个表示烷基、芳基或卤素原子。
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20140005409A1

  公开（公告）日：2014-01-02

  A compound represented by the following formula (I): wherein in formula (I), R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, a carbamoyl group, a sulfamoyl group, a sulfo group, a cyano group, an aryl group or a heteroaryl group; R 2 represents an alkyl group or an aryl group; each of R 3 and R 4 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, a carbonyl group or an aryl group; X represents —O—, —S—, —NH—, —NR 5 —, —CH 2 —, —CR 6 H— or —CR 6 R 7 —; each of R 5 to R 7 independently represents an alkyl group or an aryl group; and R 1 and any one of R 5 to R 7 , or R 3 and R 4 , may be bonded to each other to form a ring.

  化合物的化学式为(I)：在化学式(I)中，R1代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、酰基、氨基羰基团、磺胺基团、磺基、氰基、芳基或杂环芳基；R2代表烷基基团或芳基；R3和R4中的每一个独立代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、羰基或芳基；X代表—O—、—S—、—NH—、—NR5—、—CH2—、—CR6H—或—CR6R7—；R5到R7中的每一个独立代表烷基基团或芳基；R1和R5到R7中的任意一个，或R3和R4，可以相互连接形成环。
• Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Ando Nobuo

  公开号：US20070149702A1

  公开（公告）日：2007-06-28

  The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

  本发明提供了一种树脂，通过辐射产生酸，是有机阳离子和阴离子聚合物的盐，其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂的化学增感光阻组合物。
• RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME
  申请人：ANDO Nobuo

  公开号：US20110165519A1

  公开（公告）日：2011-07-07

  The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

  本发明提供了一种树脂，该树脂通过辐射发生酸化作用，是有机阳离子和阴离子聚合物的盐，其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂的化学增感光阻组合物。