ammonium pelargonate | 63718-65-0

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: ammonium pelargonate
• 英文别名: ammonium salt of nonanoic acid；anhydrous ammonium pelargonate；Ammonium Nonanoate; Nonanoic acid, ammonium salt (9CI); Ammonium nonanoate; Ammonium pelargonate; Pelargonic acid ammonium salt; Nonanoic Acid Ammonium；azane;nonanoic acid
• CAS: 63718-65-0
• 化学式: C₉H₁₇O₂*H₄N
• 分子量: 175.271
• InChiKey: KLIDOSBTXDALBI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.86
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  41.1
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  ammonium pelargonate 在 octanedioic acid ; neutral ammonium salt 作用下， 19.9 ℃ 、7999.96 MPa 条件下， 以13.0%的产率得到壬醯胺
  参考文献：
  名称：

  Study of the reactivity of ammonium carboxylates in the synthesis of amides under high-pressure deformation conditions

  摘要：

  DOI：

  10.1007/bf00962116
• 作为产物：
  描述：

  壬酸 在 ammonium hydroxide 作用下， 以97.6%的产率得到ammonium pelargonate
  参考文献：
  名称：

  Bactericidal method of using compounds of fatty acids and ammonium fatty acid salts

  摘要：

  一摩尔游离脂肪酸和一摩尔脂肪酸铵盐组成的化合物，其结构式表示为(I):CH3(CH2)xCOOH.CH3(CH2)xCOO−NH4+，其中x为6、7或8。可以通过在受细菌污染的表面上施加足量的该化合物来消毒细菌污染的表面或从细菌污染的表面上去除细菌。

  公开号：

  US10426163B1

文献信息

• USE OF BENZOXEPIN DERIVATIVES AS A HERBICIDE
  申请人：ECOLE POLYTECHNIQUE

  公开号：US20220183292A1

  公开（公告）日：2022-06-16

  The invention relates to the use, as a herbicide, of at least one compound chosen from the compounds of general formula (I) and organic or inorganic salts thereof and isomers thereof. The invention also relates to a phytotoxic composition and to a method for controlling the development of and/or treating undesirable plants on the surface of a target zone.

  本发明涉及使用一种或多种通式(I)化合物及其有机或无机盐和同分异构体作为除草剂的用途。本发明还涉及一种植物毒性组合物和一种控制目标区域表面上不良植物的生长和/或处理的方法。
• Photosensitive composition and method for forming pattern using the same
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP1612602A2

  公开（公告）日：2006-01-04

  A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.

  本发明提供了一种可用于集成电路等半导体的制造步骤、液晶和热敏头等电路板的制造以及其他制造步骤，并具有出色的分辨率和线边粗糙度的正向工作光敏组合物，以及使用该组合物形成图案的方法，该组合物是一种光敏组合物，其中含有(A)具有特定基团的重复单元的树脂，其在碱性显影剂中的溶解度在酸的作用下会增加，以及使用该组合物形成图案的方法。
• RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE
  申请人：Hitachi Chemical Company, Ltd.

  公开号：EP1672426A1

  公开（公告）日：2006-06-21

  The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a) and containing an aprotic solvent.

  本发明提供了一种辐射固化组合物，该组合物包括（a）：硅氧烷树脂；（b）：光酸发生器或光碱发生器；以及（c）：能够溶解（a）组分并含有壬烷溶剂的溶剂。
• HIGHLY SATURATED NITRILE RUBBER FOR SEALING MATERIAL AND CROSSLINKED RUBBER
  申请人：Zeon Corporation

  公开号：EP2177547A1

  公开（公告）日：2010-04-21

  A highly saturated nitrile rubber for a seal material used for sealing a solution containing an alcohol, the highly saturated nitrile rubber for a seal material having an iodine value of 80 or less and a content of a surfactant of 0.4 wt% or less. According to the present invention, it is possible to effectively prevent leaching of a contained ingredient by a water soluble ink, a fuel oil containing alcohol, or another solution containing an alcohol and possible to give cross-linked rubber superior in heat aging resistance.

  一种密封材料用高饱和度丁腈橡胶，用于密封含有酒精的溶液，这种密封材料用高饱和度丁腈橡胶的碘值小于或等于 80，表面活性剂含量小于或等于 0.4 wt%。根据本发明，可以有效防止所含成分被水溶性油墨、含酒精的燃料油或另一种含酒精的溶液浸出，并可提供耐热老化性能优异的交联橡胶。
• Inorganic film-forming composition for multilayer resist processes, and pattern-forming method
  申请人：JSR CORPORATION

  公开号：US10090163B2

  公开（公告）日：2018-10-02

  An inorganic film-forming composition for multilayer resist processes includes a complex that includes: metal atoms; at least one bridging ligand; and a ligand which is other than the at least one bridging ligand and which is derived from a hydroxy acid ester, a β-diketone, a β-keto ester, a β-dicarboxylic acid ester or a combination thereof. The at least one bridging ligand includes a first bridging ligand derived from a compound represented by formula (1). An amount of the first bridging ligand is no less than 50 mol % with respect to a total of the bridging ligand. In the formula (1), R1 represents an organic group having a valency of n. X represents —OH, —COOH, —NCO or —NHRa, wherein Ra represents a hydrogen atom or a monovalent organic group. n is an integer of 2 to 4. R1X)n  (1)

  一种用于多层抗蚀剂工艺的无机成膜组合物包括一种配合物，该配合物包括：金属原子；至少一种桥接配体；以及除至少一种桥接配体之外的配体，该配体衍生自羟基酸酯、β-二酮、β-酮酯、β-二羧酸酯或其组合。至少一种桥接配体包括衍生自式（1）所代表化合物的第一桥接配体。第一桥接配体的量不低于桥接配体总量的 50 摩尔%。在式 (1) 中，R1 代表化合价为 n 的有机基团。X代表-OH、-COOH、-NCO或-NHRa，其中Ra代表氢原子或一价有机基团。 R1X)n (1)