Norbornene-based biocidal polymers having primary, secondary or tertiary amine or phosphine end groups, the parent monomers, processes for preparing the monomers and polymers, and their use.
US6426171B1
申请人:——
公开号:US6426171B1
公开(公告)日:2002-07-30
US8148484B2
申请人:——
公开号:US8148484B2
公开(公告)日:2012-04-03
Photoresist monomer, polymer thereof and photoresist composition containing it
申请人:Hyundai Electronics Industries Co., Ltd.
公开号:US06426171B1
公开(公告)日:2002-07-30
The present invention provides novel bicyclic photoresist monomers, and photoresist copolymer derived from the same. The bicyclic photoresist monomers of the present invention are represented by the formula:
where m, n, R, V and B are those defined herein. The photoresist composition comprising the photoresist copolymer of the present invention has excellent etching resistance and heat resistance, and remarkably enhanced PED stability (post exposure delay stability).