Organic Silane Compound, Method of Producing the Same, and Organic Thin Film Using the Same
申请人:Imada Hiroshi
公开号:US20080312463A1
公开(公告)日:2008-12-18
The present invention provides a highly ordered, crystallized organic thin film superior in electroconductive properties that is resistant to exfoliation, a compound for preparation of the thin film, and a method of producing the same.
An organic silane compound, characterized in that a molecule represented by General Formula (I) is substituted with a silyl group.
A method of producing the organic silane compound, comprising halogenating a molecule (I) and allowing it to react with a silane derivative.
An organic thin film, wherein the organic silane compound molecule is oriented with its silyl group located in the substrate side and the molecule (I) region in the film surface side.
(wherein, x1 and x2 are integers satisfying 1≦x1, 1≦x2, and 2≦x1+x2≦8; each of y1 and z1 is independently an integer of 2 to 8; each of y2 and z2 is independently an integer of 0 to 8; and the skeleton may be substituted with a hydrophobic group).
本发明提供了一种高度有序、结晶的有机薄膜,具有优越的导电性能,能够抵抗剥离,一种用于制备该薄膜的化合物,以及生产该薄膜的方法。一种有机硅烷化合物,其特征在于,由通用式(I)表示的分子被硅烷基取代。生产该有机硅烷化合物的方法,包括卤代化分子(I)并使其与硅烷衍生物发生反应。一种有机薄膜,其中有机硅烷化合物分子被定向,其硅烷基位于基底侧,而分子(I)区域位于薄膜表面侧。(其中,x1和x2是满足1≦x1,1≦x2,且2≦x1+x2≦8的整数;每个y1和z1独立地为2到8的整数;每个y2和z2独立地为0到8的整数;骨架可能被疏水基取代)。