Provided are a method of preparing a graphene quantum dot, a graphene quantum dot prepared using the method, a hardmask composition including the graphene quantum dot, a method of forming a pattern using the hardmask composition, and a hardmask obtained from the hardmask composition. The method of preparing a graphene quantum dot includes reacting a graphene quantum dot composition and an including a polyaromatic hydrocarbon compound and an organic solvent at an atmospheric pressure and a temperature of about 250° C. The polyaromatic hydrocarbon compound may include at least four aromatic rings.
本发明提供了一种制备
石墨烯量子点的方法、一种使用该方法制备的
石墨烯量子点、一种包括
石墨烯量子点的硬掩膜组合物、一种使用硬掩膜组合物形成图案的方法,以及一种由硬掩膜组合物获得的硬掩膜。制备
石墨烯量子点的方法包括在大气压和约 250° C 的温度下,使
石墨烯量子点组合物与包括多
芳烃化合物和有机溶剂的物质反应。