Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part
申请人:Hitachi Chemical DuPont MicroSystems Ltd.
公开号:EP1013650A2
公开(公告)日:2000-06-28
A 6,6'-dialkyl-3,3',4,4'-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern.
wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.
一种 6,6'-二烷基-3,3',4,4'-联苯四羧酸二酐是通过在其 5 位上溴化 4-烷基邻苯二甲酸酐,并在镍催化剂存在下偶联溴化产物而制备的;一种含有具有通式(7)重复单元的聚酰亚胺前体的光敏树脂组合物被涂覆在基底上,暴露于 i-线,显影并加热以形成聚酰亚胺浮雕图案。
其中 Y 是二价有机基团,R7 和 R8 是 OH 或一价有机基团,R9 和 R10 是一价烃基团,R11、R12 和 R13 是一价烃基团,a 和 b 是 0 至 2 的整数,c 是 0 至 4 的整数,m 是 0 至 3 的整数。