trans-crotonic acid-(2-chloro-ethyl ester) | 95397-52-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: trans-crotonic acid-(2-chloro-ethyl ester)
• 英文别名: trans-Crotonsaeure-(2-chlor-aethylester)；2-chloroethyl (E)-but-2-enoate
• CAS: 95397-52-7
• 化学式: C₆H₉ClO₂
• 分子量: 148.589
• InChiKey: SFUFKOOLYBPIOG-NSCUHMNNSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  9
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  trans-crotonic acid-(2-chloro-ethyl ester) 在 potassium hydride 作用下， 以 乙二醇二甲醚 为溶剂， 生成 2-prop-2-enylidene-1,3-dioxolane
  参考文献：
  名称：

  不饱和羧酸的二价阴离子的13 C NMR研究

  摘要：

  考察了由不饱和羧酸1至6被二烷基酰胺锂双重去质子化后的二价阴离子Li 2 -n的13 C NMR光谱。观察到C 2的原子共振高于C 4原子，这表明C 2的电子密度高于C 4的电子，这与这些二价阴离子与亲电子试剂反应所表现出的动力学α-区域选择性一致。

  DOI：

  10.1016/s0040-4020(01)90421-1
• 作为产物：
  描述：

  巴豆酸 、 2-氯乙醇 在 4-二甲氨基吡啶 、 N,N'-二环己基碳二亚胺 作用下， 以 二氯甲烷 为溶剂， 反应 4.0h， 生成 trans-crotonic acid-(2-chloro-ethyl ester)
  参考文献：
  名称：

  不饱和羧酸的二价阴离子的13 C NMR研究

  摘要：

  考察了由不饱和羧酸1至6被二烷基酰胺锂双重去质子化后的二价阴离子Li 2 -n的13 C NMR光谱。观察到C 2的原子共振高于C 4原子，这表明C 2的电子密度高于C 4的电子，这与这些二价阴离子与亲电子试剂反应所表现出的动力学α-区域选择性一致。

  DOI：

  10.1016/s0040-4020(01)90421-1

文献信息

• Acid-degradable resin compositions containing ketene-aldehyde copolymer
  申请人：Sudo Atsushi

  公开号：US20050130057A1

  公开（公告）日：2005-06-16

  It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R 1 and R 2 independently represent hydrogen atom, halogen atom, C 1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R 4 group, S(O) n R 4 group, P(═O)(R 4 ) 2 group or M(R 4 ) 3 group; R 3 represents C 1-20 hydrocarbon group or a heterocyclic group: R 4 represents C 1-20 hydrocarbonoxy group, C 1-20 hydrocarbon group, C 1-20 hydrocarbonthio group or mono- or di-C 1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2 , and an acid or a compound capable of generating an acid in response to an external stimulus.

  本发明旨在提供用于制备高灵敏度和高分辨率细微图案的抗蚀剂等组合物，通过增加曝光部分和未曝光部分之间的溶解度差异。可降解酸性组合物包含具有以下通式（I）所表示的重复单元的聚合物：其中，R1和R2独立地表示氢原子、卤素原子、C1-20碳氢基团、杂环基团、氰基团、硝基团、C（═O）R4基团、S（O）nR4基团、P（═O）（R4）2基团或M（R4）3基团；R3表示C1-20碳氢基团或杂环基团；R4表示C1-20碳氢氧基团、C1-20碳氢基团、C1-20碳氢硫基团或单烷基或二烷基氨基基团；M表示硅、锗、锡或铅原子；n为0、1或2，以及一种酸或能够响应外部刺激产生酸的化合物。
• Acrylic Acid-Based Polymer and Method of Producing the Same
  申请人：Kubo Hideo

  公开号：US20090111961A1

  公开（公告）日：2009-04-30

  Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (α-lower alkyl)acrylic ester represented by formula (I): (wherein R 1 represents a hydrogen atom or a lower alkyl group, and R 2 represents an organic group having a polar group) in an arm portion; an acrylic acid-based polymer containing a repeating unit derived from an poly(α-lower alkyl)acrylic ester and a repeating unit derived from an (α-lower alkyl)acrylic ester represented by formula (I), and a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species.

  本发明涉及一种基于丙烯酸的星型聚合物，其包含来自式（I）所表示的（α-较低烷基）丙烯酸酯的重复单元的臂部分；以及一种基于丙烯酸的聚合物，其包含来自聚（α-较低烷基）丙烯酸酯和式（I）所表示的（α-较低烷基）丙烯酸酯的重复单元，并且本发明还提供了通过活性聚合制备聚合物的方法，包括形成具有聚合活性端的寡聚体，该寡聚体高于平均1.0-聚体但低于平均4.0-聚体或平均4.0-聚体，并以具有聚合活性端的寡聚体作为引发物种进行聚合。
• ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME
  申请人：Kubo Hideo

  公开号：US20110046333A1

  公开（公告）日：2011-02-24

  Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (α-lower alkyl)acrylic ester represented by formula (I): (wherein R 1 represents a hydrogen atom or a lower alkyl group, and R 2 represents an organic group having a polar group) in an arm portion; an acrylic acid-based polymer containing a repeating unit derived from an poly(α-lower alkyl)acrylic ester and a repeating unit derived from an (α-lower alkyl)acrylic ester represented by formula (I), and a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species.

  本文揭示了一种基于丙烯酸的星形聚合物，其包含由公式(I)表示的(α-低烷基)丙烯酸酯衍生的重复单元的臂部分；一种基于丙烯酸的聚合物，其中包含由聚(α-低烷基)丙烯酸酯和由公式(I)表示的(α-低烷基)丙烯酸酯衍生的重复单元，并且通过活性聚合法制备聚合物的方法，包括形成具有聚合活性端的寡聚物，该寡聚物高于平均1.0-聚体但低于平均4.0-聚体或平均4.0-聚体，并使用具有聚合活性端的寡聚物作为引发物种进行聚合。
• ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER
  申请人：NIPPON SODA CO., LTD.

  公开号：EP1482361A1

  公开（公告）日：2004-12-01

  It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(=O)R4 group, S(O)nR4 group, P(=O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di- C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.

  本发明旨在提供用于抗蚀剂等的组合物，通过增大暴露部分和未暴露部分之间的溶解度差异，形成具有高灵敏度和高分辨率的精细图案。可酸性降解组合物含有一种聚合物，其重复单元由以下通式 (I) 表示： 其中 R1 和 R2 分别代表氢原子、卤素原子、C1-20 烃基、杂环基、氰基、硝基、C(＝O)R4 基、S(O)nR4 基、P(＝O)(R4)2 基或 M(R4)3 基；R3 代表 C1-20 烃基或杂环基：R4代表C1-20烃氧基、C1-20烃基、C1-20烃硫基或单-或双-C1-20烃氨基；M代表硅、锗、锡或铅原子；n为0、1或2。
• ACRYLIC ACID POLYMER AND METHOD FOR PRODUCING SAME
  申请人：NIPPON SODA CO., LTD.

  公开号：EP1892255A1

  公开（公告）日：2008-02-27

  Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (α-lower alkyl)acrylic ester represented by formula (I): (wherein R1 represents a hydrogen atom or a lower alkyl group, and R2 represents an organic group having a polar group) in an arm portion; an acrylic acid-based polymer containing a repeating unit derived from an poly(α-lower alkyl)acrylic ester and a repeating unit derived from an (α-lower alkyl)acrylic ester represented by formula (I), and a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species.

  本发明公开了一种丙烯酸基聚合物，它是一种星型聚合物，含有由式（I）表示的（α-低级烷基）丙烯酸酯衍生的重复单元： (其中 R1 代表氢原子或低级烷基，R2 代表具有极性基团的有机基团)的臂部分；一种丙烯酸基聚合物，其含有衍生自聚(α-低级烷基)丙烯酸酯的重复单元和衍生自式(I)代表的(α-低级烷基)丙烯酸酯的重复单元，以及一种通过活聚合生产聚合物的方法，包括形成具有聚合活性端的低聚物，该低聚物是高于平均 1.0-mer 和低于平均 4.0-mer 或平均 4.0-mer 的低聚物，并使用具有聚合活性端的低聚物作为引发物进行聚合。