2-氯丙烯酸1,1-二甲基乙基酯 | 72088-85-8

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 2-氯丙烯酸1,1-二甲基乙基酯
• 英文名称: tert-Butyl 2-chloroacrylate
• 英文别名: tert-butyl 2-chloroprop-2-enoate
• CAS: 72088-85-8
• 化学式: C₇H₁₁ClO₂
• 分子量: 162.61
• InChiKey: ISIMQTCWOTYBLH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  10
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-氯丙烯酸 、 甲烷磺酸 、 异丁烯 、 碳酸氢钠 在 二氯甲烷 、 Sodium sulfate-III 作用下， 以 二氯甲烷 为溶剂， 反应 30.0h， 生成 2-氯丙烯酸1,1-二甲基乙基酯
  参考文献：
  名称：

  Positive-working radiation-sensitive composition and process for forming a pattern

  摘要：

  本发明涉及一种正向感光组合物，其特征在于它是一种含有聚合物的正向感光组合物，该聚合物的溶解度在酸的作用下增加，而辐射引起的聚合物主链断裂易于发生，其易于发生的程度大于聚甲基丙烯酸甲酯的程度。本发明还涉及一种正向感光组合物，其特征在于它含有一种碱溶性聚合物、一种具有抑制该碱溶性聚合物碱溶性的效果的化合物，其抑制效果在酸的作用下降低或消除，以及一种通过辐射发生酸的化合物，而辐射引起的该碱溶性聚合物主链断裂易于发生，其易于发生的程度大于聚甲基丙烯酸甲酯的程度。通过本发明，可以获得一种高灵敏度的正向感光组合物，其分辨率可以实现亚四分之一微米的图案处理。

  公开号：

  US06576400B1

文献信息

• Resin useful for resist, resist composition and pattern forming process using the same
  申请人：KABUSHIKI KAISHA TOSHIBA

  公开号：US20020098441A1

  公开（公告）日：2002-07-25

  According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

  根据本发明，提供了一种在其结构中具有特定桥式键含有的脂环的抗蚀树脂，以及包括该树脂的抗蚀组合物。通过使用这种抗蚀组合物，可以通过高分辨率的碱性显影形成对短波长光具有优异透明度和干法刻蚀抗性的抗蚀图案。
• POSITIVE TYPE RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING PATTERN WITH THE SAME
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP1229390A1

  公开（公告）日：2002-08-07

  The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) (R1 and R2 are aromatic rings, and R3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R1 to R3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R4 to R6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

  本发明涉及一种正向工作的辐射敏感组合物，其特征在于它含有符合 a1) 至 a3) 中任一条件的化合物，以及 b) 一种通过辐射产生酸的酸发生器；本发明还涉及一种使用这种组合物生产抗蚀剂图案的方法。 a1)一种化合物，其中的羧基被通式(1)代表的酸性基团所保护 (R1和R2为芳香环，R3代表烷基、取代烷基、环烷基或芳香环。R1 至 R3 可以相同或不同）。 a2)一种化合物，其中的碱溶性基团被通式（2）所代表的酸性基团所保护 (R4至R6各自为烷基、取代烷基、环烷基或芳香环，且R4至R6中至少有一个为带有电子奉献基团的芳香环。R4 至 R6 可以相同或不同)。 a3)碱溶性基团被酸性基团 a 保护，且酸性基团 a 具有碱溶性基团或酸性基团 a 具有被酸性基团 b 保护的碱溶性基团的化合物。 通过这种结构，本发明可以获得一种高灵敏度的正向工作辐射敏感组合物，其分辨率可以进行四分之一微米以下的图案加工。
• NON-FLUORINATED BLOCK COPOLYMER
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP3858881A1

  公开（公告）日：2021-08-04

  Provided is a non-fluorinated block copolymer comprising at least one block segment (A), wherein the block segment (A) comprises a repeating unit formed from one or more types of acrylic monomer having a long-chain hydrocarbon group containing 7-40 carbon atoms, and the block copolymer imparts superior liquid repellency to a base material such as fibers. The non-fluorinated block copolymer preferably contains a segment (B) constituted by at least one of: (B1) a block segment comprising a repeating unit, different from that of segment (A), that is formed from an acrylic monomer having a long-chain hydrocarbon group comprising 7-40 carbon atoms; (B2) a block segment comprising a repeating unit formed from an acrylic monomer not having a long-chain hydrocarbon group; and (B3) a random segment formed from at least two types of acrylic monomers.

  本发明提供了一种无氟嵌段共聚物，该共聚物包含至少一个嵌段（A），其中嵌段（A）包含由一种或多种类型的丙烯酸单体形成的重复单元，该丙烯酸单体具有含有 7-40 个碳原子的长链烃基，并且该嵌段共聚物可为纤维等基材提供优异的憎液性能。无氟嵌段共聚物最好包含由以下至少一种材料构成的嵌段 (B)：(B1) 嵌段，该嵌段包含与嵌段 (A) 不同的重复单元，该重复单元由具有含 7-40 个碳原子的长链烃基的丙烯酸单体形成；(B2) 嵌段，该嵌段包含由不具有长链烃基的丙烯酸单体形成的重复单元；以及 (B3) 由至少两种丙烯酸单体形成的无规嵌段。
• WATER REPELLENT COMPOSITION
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP3904588A1

  公开（公告）日：2021-11-03

  Provided is a water repellent composition which imparts excellent water repellency to a substrate, such as a fiber. The water repellent composition comprises: (A) water repellent particles in which the number of surface alkyl groups on the water repellent particles is 600×1018-50,000×1018 per 1 g of water repellent particles; (B) a water-repellent resin which is a polymer having a long-chain C7-40 hydrocarbon group; and (C) a liquid medium. The water-repellent particles preferably have an average primary particle size of 1-100 nm.

  本发明提供了一种憎水剂组合物，它能赋予纤维等基材优异的憎水性。该憎水剂组合物包括：（A）憎水粒子，其中每 1 克憎水粒子上的表面烷基数为 600×1018-50,000×1018；（B）憎水树脂，它是具有长链 C7-40 碳氢基的聚合物；以及（C）液体介质。憎水粒子的平均主粒径最好为 1-100 纳米。
• Positive type radiation-sensitive composition and process for processing for producing pattern with the same
  申请人：——

  公开号：US20030003392A1

  公开（公告）日：2003-01-02

  The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) 1 (R 1 and R 2 are aromatic rings, and R 3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R 1 to R 3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) 2 (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R 4 to R 6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

  本发明涉及一种积极工作的辐射敏感组合物，其特征在于它含有符合 a1）至 a3）中任一条件的化合物，以及 b）一种通过辐射产生酸的酸发生器；本发明还涉及一种用其生产抗蚀剂图案的方法。 a1)一种化合物，其中的羧基被通式(1)代表的易酸基团所保护 1 (R 1 和 R 2 是芳香环，R 3 代表烷基、取代烷基、环烷基或芳香环。R 1 至 R 3 可以相同或不同）。 a2) 碱溶性基团被通式（2）所代表的酸性基团保护的化合物 2 (R4 至 R6 各为烷基、取代烷基、环烷基或芳香环，且 R4 至 R6 中至少有一个是带有电子奉献基团的芳香环。R 4 至 R 6 可以相同或不同）。 a3)碱溶性基团被酸性基团 a 保护，且酸性基团 a 具有碱溶性基团或酸性基团 a 具有被酸性基团 b 保护的碱溶性基团的化合物。 通过这种结构，本发明可以获得一种高灵敏度的正向工作辐射敏感组合物，其分辨率可以进行四分之一微米以下的图案加工。