N¹-phenylsulfonyl-N²,N³-dicyclohexylguanidine | 5667-51-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N¹-phenylsulfonyl-N²,N³-dicyclohexylguanidine
• 英文别名: N--benzolsulfonamid；1-(Benzenesulfonyl)-2,3-dicyclohexylguanidine
• CAS: 5667-51-6
• 化学式: C₁₉H₂₉N₃O₂S
• 分子量: 363.524
• InChiKey: PUPBRLNDKLWDPL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  25
• 可旋转键数：
  6
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.63
• 拓扑面积：
  78.9
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  N¹-phenylsulfonyl-N²,N³-dicyclohexylguanidine 、 potassium p-toluenesulfonamide 以 N,N-二甲基甲酰胺 为溶剂， 反应 6.0h， 以44%的产率得到N¹-phenylsulfonyl-N²-tolylsulfonyl-N³-cyclohexylguanidine
  参考文献：
  名称：

  Dubina, V. L.; Dobronravov, A. N., Journal of Organic Chemistry USSR (English Translation), 1989, vol. 25, # 9.1, p. 1731 - 1734

  摘要：

  DOI：
• 作为产物：
  描述：

  N-bis-(methylsulfanylmethylene)benzenesulfonamide 在 氯 作用下， 以 四氯化碳 、 苯 为溶剂， 生成 N¹-phenylsulfonyl-N²,N³-dicyclohexylguanidine
  参考文献：
  名称：

  N ‐Methylen‐sulfonamid‐Derivate

  摘要：

  AbstractDie Chlorierung von N‐[Bis‐methylmercapto‐methylen]‐Arylsulfonamiden bzw.‐alkylsulfonamiden führt zu N‐Dichlormethylen‐ bzw. N‐[Chlor‐methylmercapto‐methylen]‐sulfonamiden. N‐Dichlormethylen‐benzolsulfonamid setzt sich mit Äthylmercaptan zu N‐[Bis‐äthylmercaptomethylen]‐benzolsulfonamid, mit Aminen zu N‐Diaminomethylen‐benzolsulfonamiden (N‐Benzolsulfonyl‐guanidinen), mit Trialkylphosphiten zu N‐[Bis‐dialkoxyphosphinyl‐methylen]‐benzolsulfonamiden und mit Alkylammoniumchloriden zu N‐Benzolsulfonyl‐carbodiimiden um.

  DOI：

  10.1002/cber.19660990428

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN
  申请人：FUJIFILM Corporation

  公开号：US20150132688A1

  公开（公告）日：2015-05-14

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种光致射线敏感或辐射敏感的树脂组合物，其中包括（P）具有（a）由特定公式表示的重复单元的树脂；使用该光致射线敏感或辐射敏感的树脂组合物形成的抗蚀膜；包括（i）使用该光致射线敏感或辐射敏感的树脂组合物形成膜的步骤，（ii）曝光膜的步骤，以及（iii）使用显影剂显影曝光的膜以形成图案的图案形成方法；一种制造电子设备的方法，包括图案形成方法；以及通过电子设备的制造方法制造的电子设备。
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160018734A1

  公开（公告）日：2016-01-21

  There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.

  提供了一种图案形成方法，包括以下步骤：(a)使用电子束敏感或极紫外辐射敏感的树脂组合物在基板上形成薄膜的步骤，(b)使用含有至少一个由下式(I-1)到(I-5)中所示的重复单元表示的树脂(T)的顶层涂料组成的顶层涂料层的形成步骤，(c)使用电子束或极紫外辐射照射具有顶层涂料层的薄膜的步骤，以及(d)在照射后开发具有顶层涂料层的薄膜以形成图案的步骤。
• DUBINA, V. L.;DOBRONRAVOV, A. N., ZH. ORGAN. XIMII, 25,(1989) N, S. 1915-1920
  作者：DUBINA, V. L.、DOBRONRAVOV, A. N.

  DOI：——

  日期：——
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：HIRANO Shuji

  公开号：US20120003590A1

  公开（公告）日：2012-01-05

  An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation.
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM CORPORATION

  公开号：US20140227636A1

  公开（公告）日：2014-08-14

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.