Dibenzodiazepin derivatives, a process for their preparation and their use as medicaments
申请人:HOECHST-ROUSSEL
PHARMACEUTICALS INCORPORATED
公开号:EP0129692A2
公开(公告)日:1985-01-02
The invention relates to dihydrobenzopyrrolobenzodiazepines of the formula
where X and Y may be the same or different and each is hydrogen, halogen, CF., lower alkoxy, lower alkylthio and lower alkylsulfonyl; R, is hydrogen when R2 is bonded to R3 to form a -(CH2)m-CH2-group or a -CH=CH-group; R3 is hydrogen when R, is bonded to R. to form a -(CH2)m-CH2- group or a -CH-CH- group; and R4 is NR5R6 wherein R. is hydrogen or lower alkyl and R6 is hydrogen, lower alkyl or a group of the formula (CH2)nNR7R8 wherein R7 and R. are lower alkyl, m is 1 or 2 and n is 2 or 3,
wherein R. is lower alkyl,
or
wherein R10 is lower alkyl, phenyl, phenyl substituted by halogen, CF3, lower alkyl, lower alkoxy or lower alkylthio, benzyl, benzyl in which the phenyl group is substituted by halogen, CF3, lower alkyl, lower alkoxy or lower alkylthio or CO2R11, wherein R11 is lower alkyl, or a pharmaceutically acceptable acid salt thereof.
本发明涉及式如下的二氢吡咯并二氮杂卓
式中 X 和 Y 可以相同或不同,各自为氢、卤素、CF、当 R2 与 R3 键合形成-(CH2)m-CH2-基团或-CH=CH-基团时,R3 为氢;当 R2 与 R3 键合形成-(CH2)m-CH2-基团或-CH=CH-基团时,R3 为氢。和 R4 是 NR5R6,其中 R. 是氢或低级烷基,R6 是氢、低级烷基或式 (CH2)nNR7R8 的基团,其中 R7 和 R. 是低级烷基,m 是 1 或 2,n 是 2 或 3、
其中 R. 为低级烷基
或
其中 R10 为低级烷基、苯基、被卤素、CF3、低级烷基、低级烷氧基或低级烷硫基取代的苯基、苄基、苯基被卤素、CF3、低级烷基、低级烷氧基或低级烷硫基取代的苄基或 CO2R11(其中 R11 为低级烷基)或其药学上可接受的酸盐。