4-ethyl-1-vinyloxybenzene | 79054-56-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-ethyl-1-vinyloxybenzene
• 英文别名: p-Ethyl(vinyloxy)benzene；1-ethenoxy-4-ethylbenzene
• CAS: 79054-56-1
• 化学式: C₁₀H₁₂O
• 分子量: 148.205
• InChiKey: NOKHVAUMEFGUDF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  4-ethyl-1-vinyloxybenzene 、 1-对甲苯磺酰基苯并咪唑 在 N-氯代丁二酰亚胺 、 (CuOTf)*toluene 、 iron perchlorate hexahydrate 、 3,4,7,8-四甲基-1,10-菲罗啉 、 二叔丁基过氧化物 、 lithium carbonate 、 lithium bromide 作用下， 以 甲苯 为溶剂， 反应 36.0h， 以21%的产率得到(E)-1-methyl-4-((4-(vinyloxy)styryl)sulfonyl)benzene
  参考文献：
  名称：

  铜催化烷基芳烃的脱氢烯烃磺化

  摘要：

  已经开发出铜催化的用于将乙苯脱氢成苯乙烯衍生物的反应方案。该反应过程在温和的反应条件下进行得很好，为生物学和药学上重要的分子（如乙烯基砜）的快速组装提供了实用而有效的策略。在存在N-磺酰基苯并[ d ]咪唑的情况下，通过连续的β-消除作用将简单的烷基芳烃官能化，具有广泛的底物范围和良好的官能团耐受性。

  DOI：

  10.1021/acs.orglett.0c03146
• 作为产物：
  描述：

  乙炔 以1%的产率得到
  参考文献：
  名称：

  TROFIMOV B. A.; AMOSOVA S. V.; TARASOVA O. A.; KALABIN G. A., ZH. ORGAN. XIMII, 1981, 17, HO 5, 1099

  摘要：

  DOI：

文献信息

• POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING THE SAME, PATTERNING PROCESS, AND LAMINATE
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3214497A1

  公开（公告）日：2017-09-06

  The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.

  本发明提供了一种正性光敏树脂组合物，该组合物含有(A)含有硅氧烷链的高分子化合物，该高分子化合物具有通式(1)所示的重复单元，重量平均分子量为3,000至500,000；(B)能够在碱性水溶液中通过光产生酸并提高溶解速率的光敏材料；(C)交联剂；以及(D)溶剂。本发明提供了一种正性光敏树脂组合物，它可以解决在铜和铝等金属配线、电极和基板上，特别是在氮化硅等基板上产生的分层问题，并且在使用广泛使用的 2.38% TMAH 水溶液作为显影剂时，可以形成具有正锥形的精细图案，而不会在图案底部和基板上产生浮渣和脚底轮廓。
• FILM-FORMING COMPOSITION CONTAINING CROSSLINKABLE REACTIVE SILICONE
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP3222688A1

  公开（公告）日：2017-09-27

  There is provided film-forming composition having favorable effects such as curability and embeddability and resist underlayer film for use in lithography process for semiconductor devices. A film-forming composition comprising, as silane, hydrolyzable silane, hydrolysis product thereof, or hydrolysis-condensation product thereof, wherein hydrolyzable silane includes hydrolyzable silane of Formula (1):         R1aR2bSi(R3)4-(a+b)     Formula (1) in Formula (1), R1 is organic group of Formula (2) and is bonded to silicon atom through Si-C bond: Film-forming composition, wherein the hydrolyzable silane is combination of hydrolyzable silane of Formula (1) with another hydrolyzable silane, wherein other hydrolyzable silane is at least one selected from group consisting of hydrolyzable silane of Formula (3):         R7cSi(R8)4-c     Formula (3) and hydrolyzable silane of Formula (4):         (R9dSi(R10)3-d]2Ye     Formula (4) Resist underlayer film, obtained by applying the resist underlayer film-forming composition on semiconductor substrate and baking.

  本发明提供的成膜组合物具有良好的效果，如固化性和嵌入性以及用于半导体器件光刻工艺的抗蚀底层膜。 一种成膜组合物，包括作为硅烷的可水解硅烷、其水解产物或其水解缩合产物，其中可水解硅烷包括式（1）的可水解硅烷： R1aR2bSi(R3)4-(a+b) 式(1) 在式(1)中，R1 是式(2)的有机基团，并通过 Si-C 键与硅原子结合： 成膜组合物，其中可水解硅烷是式(1)的可水解硅烷与另一种可水解硅烷的组合，其中另一种可水解硅烷至少是从式(3)的可水解硅烷组成的组中选出的一种： R7cSi(R8)4-c 式(3) 和式 (4) 的可水解硅烷： (R9dSi(R10)3-d]2Ye 式（4） 将抗蚀剂底层成膜组合物涂在半导体衬底上并烘烤而得到的抗蚀剂底层薄膜。
• Thiol compound derivative, hardening compositions containing these derivatives and molded articles thereof
  申请人：——

  公开号：US20040162368A1

  公开（公告）日：2004-08-19

  The present invention relates to a thiol compound derivative represented by the following formula (1), a curable composition containing the derivative, and a molded product made of the composition. More particularly, the invention relates to a thiol compound derivative which is added to a polymer having reactivity to a thiol derivative substituent to provide a curable composition, a curable composition containing the derivative and a crosslinkable halogen-containing crosslinking polymer, and a crosslinked molded product of the composition. 1 wherein X 1 , X 2 and X 3 are each a group represented by the following formula (2). 2

  本发明涉及由下式（1）表示的硫醇化合物衍生物、含有该衍生物的可固化组合物以及由该组合物制成的模塑产品。更具体地说，本发明涉及一种硫醇化合物衍生物，将其添加到对硫醇衍生物取代基具有反应活性的聚合物中，以提供一种可固化组合物、一种含有该衍生物和一种可交联含卤交联聚合物的可固化组合物，以及一种由该组合物制成的交联模塑产品。 1 其中 X 1 , X 2 和 X 3 分别是下式（2）所代表的一个基团。 2
• THIOL COMPOUND DERIVATIVES, HARDENING COMPOSITIONS CONTAINING THESE DERIVATIVES AND MOLDED ARTICLES THEREOF
  申请人：Unimatec Co., Ltd.

  公开号：EP1394153B1

  公开（公告）日：2010-12-29
• Regarding a Persisting Puzzle in Olefin Metathesis with Ru Complexes: Why are Transformations of Alkenes with a Small Substituent <i>Z</i>-Selective?
  作者：Sebastian Torker、Ming Joo Koh、R. Kashif M. Khan、Amir H. Hoveyda

  DOI：10.1021/acs.organomet.5b00970

  日期：2016.2.22

  An enduring question in olefin metathesis is that reactions carried out with widely accessible Ru dichloro complexes, which typically favor E alkenes, generate Z isomers preferentially when substrates bearing a smaller substituent are used; Z enol ethers, alkenyl sulfides, 1,3-enynes, alkenyl halides, or alkenyl cyanides can be prepared reliably with reasonable efficiency and selectivity. Transformations thus proceed via the more hindered syn-substituted metallacyclobutanes, which is mystifying because catalyst features implemented in the more recently developed and broadly applicable Z-selective catalysts are absent in the Ru dichloro systems. Herein, we describe experimental and computational investigations that offer a plausible rationale for these puzzling selectivity trends. The following will be demonstrated. (1) Kinetic Z selectivity depends on the relative barrier for olefin association/dissociation versus metallacyclobutane formation/cleavage. There can be appreciable stereochemical control when metallacyclobutane formation/breakage is turnover-limiting. (2) Stereoelectronic-not purely steric-effects are central: achieving the p-orbital overlap needed for alkene formation while minimizing steric repulsion between the incipient olefin substituent and a catalyst's anionic ligand during the cycloreversion step is crucial. We show that similar stereoelectronic factors are probably operative in the more recently introduced Z-selective (and enantioselective) olefin metathesis transformations promoted by stereogenic-at-Ru complexes containing a bidentate aryloxide ligand.