申请人:BASF SE
公开号:WO2016124493A1
公开(公告)日:2016-08-11
Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).
化合物的化学式(I)和(IA),其中X为-O(CO)-;R1为C1-C12卤代烷基或C6-C10卤代芳基;R2位于香豆素环的第7位,为OR8;R2a、R2b和R2C彼此独立地为氢;R3为C1-C8卤代烷基或C1-C8卤代烷基;R4为氢;R8为C1-C6烷基,适用于作为感光酸给体,用于制备光刻胶组合物,例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器(LCD)的制备。