Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
申请人:ISONO Yoshimi
公开号:US20120226070A1
公开(公告)日:2012-09-06
A fluorine-containing unsaturated carboxylic acid represented by formula (1),
wherein R
1
represents a polymerizable double-bond containing group, R
3
represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2),
wherein R
3
and W are defined as above, each of R
4
, R
5
and R
6
independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R
4
, R
5
and R
6
may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
化学式(1)所表示的含氟不饱和羧酸,其中R1代表可聚合的双键含基团,R3代表氟原子或含氟烷基团,W代表二价连接基团。该化合物可提供一种分子量为1,000-1,000,000且含有化学式(2)所表示的重复单元的含氟聚合物化合物,其中R3和W如上所定义,R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团,R4、R5和R6中至少有两个可以结合形成环。该聚合物化合物可提供一种化学增强型光刻胶组合物,该组合物对KrF或ArF准分子激光光线透明,具有高分辨率,并能够形成具有矩形截面且无膨胀的图案。