1-Iodo-2-cyclohexanecarbaldehyde | 73188-57-5

• 分子结构分类: 有机化合物 - 有机氧化合物 - 有机氧化物
• 英文名称: 1-Iodo-2-cyclohexanecarbaldehyde
• 英文别名: iodocyclohexanecarboxaldehyde；iodocyclohexanemethanaldehyde；1-Iodocyclohexane-1-carbaldehyde
• CAS: 73188-57-5
• 化学式: C₇H₁₁IO
• 分子量: 238.068
• InChiKey: LMIUDAXULPDRRD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  9
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1-Iodo-2-cyclohexanecarbaldehyde 、 苯甲醛 在 四氯化钛 、 烯丙基三甲基硅烷 作用下， 以 二氯甲烷 为溶剂， 反应 1.0h， 以75%的产率得到1-(hydroxy(phenyl)methyl)cyclohexane-1-carbaldehyde
  参考文献：
  名称：

  Enolate Formation from α-Iodoaldehydes and α-Iodoketones by Means of Allylsilane−Titanium Tetrachloride and Its Application to an Aldol Reaction

  摘要：

  DOI：

  10.1021/jo980456n
• 作为产物：
  描述：

  环己烷基甲醛 生成 1-Iodo-2-cyclohexanecarbaldehyde
  参考文献：
  名称：

  醛烯醇化物III可以直接进行醛阴离子的亚磺酰基化和碘化。

  摘要：

  直接生成的醛的烯醇钾与二苯基二硫化物反应，生成α-亚磺酰基化的醛。与碘反应同样提供α-碘醛。

  DOI：

  10.1016/s0040-4039(01)86424-8

文献信息

• Synthesis of cyclopropanols via cyclopropanation of zinc enolates
  作者：Saeko Ito、Hiroshi Shinokubo、Koichiro Oshima

  DOI：10.1016/s0040-4039(98)01036-3

  日期：1998.7

  with diethylzinc afforded zinc enolates which were converted into the corresponding cyclopropanols in good yields upon treatment with CH2I2 and Et2Zn. The use of α-iodoketone having a carbon-carbon double bond as a substrate proved that cyclopropanation of the enolate moiety proceeded chemoselectively. Cyclopropanation of the zinc enolates derived from α,β-unsaturated ketones via 1,4-addition of organozinc

  α-碘酮与二乙基锌的反应提供了烯醇锌，将其用CH 2 I 2和Et 2 Zn处理后可以良好的产率转化成相应的环丙醇。使用具有碳-碳双键的α-碘酮作为底物证明了烯醇盐部分的环丙烷化是化学选择性进行的。还通过有机锌物质的1,4-加成实现了α，β-不饱和酮衍生的烯醇锌的环丙烷化。
• CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2743249A1

  公开（公告）日：2014-06-18

  The present invention provides a cyclic compound having a molecular weight of 500 to 5000 and represented by the following formula (1), a method for producing the cyclic compound, a composition containing the cyclic compound, and a method for forming a resist pattern using the composition: wherein at least one of R0 is a monovalent group containing an iodine atom.

  本发明提供了一种分子量在 500 至 5000 之间并由下式（1）表示的环状化合物、一种生产该环状化合物的方法、一种含有该环状化合物的组合物以及一种使用该组合物形成抗蚀剂图案的方法： 其中 R0 至少有一个是含有碘原子的单价基团。
• COMPOUND, RESIN, AND METHOD FOR PURIFYING SAME, UNDERLAYER FILM FORMATION MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FORMING COMPOSITION, AND UNDERLAYER FILM, AND METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING CIRCUIT PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3279179A1

  公开（公告）日：2018-02-07

  The present invention provides a compound represented by following formula (1), wherein R1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R2 to R5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R1 to R5 represents a group including an iodine atom and at least one R4 and/or at least one R5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m2 and m3 independently represents an integer of 0 to 8, each of m4 and m5 independently represents an integer of 0 to 9, provided that m4 and m5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p2 to p5 independently represents an integer of 0 to 2.

  本发明提供了由下式（1）代表的化合物、 其中 R1 代表具有 1 至 30 个碳原子的 2n 价基团，R2 至 R5 各自独立地代表具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 1 至 30 个碳原子的烷氧基、卤素原子、硫醇基或羟基、m2和m3各自独立地代表0至8的整数，m4和m5各自独立地代表0至9的整数，但m4和m5不能同时代表0，n代表1至4的整数，p2至p5各自独立地代表0至2的整数。
• RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND RESIST PATTERN-FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3279730A1

  公开（公告）日：2018-02-07

  A radiation-sensitive composition comprising a resist base material (A), an optically active diazonaphthoquinone compound (B), and a solvent (C), wherein the content of the solvent (C) in the composition is 20 to 99% by mass, the content of components except for the solvent (C) is 1 to 80% by mass, and the resist base material (A) is a compound represented by the following formula (1): wherein R1 is a 2n-valent group of 1 to 30 carbon atoms; R2 to R5 are each independently an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, or a hydroxyl group, wherein at least one of R4 and/or at least one of R5 is one or more kinds selected from a hydroxyl group and a thiol group; m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, wherein m4 and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2.

  一种辐射敏感性组合物，由抗蚀剂基材（A）、光学活性重氮萘醌化合物（B）和溶剂（C）组成，其中溶剂（C）在组合物中的含量为 20% 至 99%（按质量计），除溶剂（C）以外的其他成分的含量为 1% 至 80%（按质量计），抗蚀剂基材（A）是由下式（1）表示的化合物： 其中 R1 是 1 至 30 个碳原子的 2n 价基团；R2 至 R5 各自独立地是 1 至 10 个碳原子的烷基、6 至 10 个碳原子的芳基、2 至 10 个碳原子的烯基、1 至 30 个碳原子的烷氧基、卤素原子、硫醇基团或羟基，其中 R4 和/或 R5 中的至少一个是选自羟基和硫醇基团的一种或多种；m2和m3各自独立地为0至8的整数；m4和m5各自独立地为0至9的整数，其中m4和m5不同时为0；n为1至4的整数；以及p2至p5各自独立地为0至2的整数。
• RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3279728A1

  公开（公告）日：2018-02-07

  The present invention provides a resist base material containing a compound having a specific structure and/or a resin derived from the compound as a monomer.

  本发明提供了一种抗蚀剂基材，其中含有一种具有特定结构的化合物和/或以该化合物为单体衍生的树脂。