1-Bromo-2,5-dimethyl-4-hexyloxy-benzene | 177217-27-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 1-Bromo-2,5-dimethyl-4-hexyloxy-benzene
• 英文别名: 1-Bromo-4-(hexyloxy)-2,5-dimethylbenzene；1-bromo-4-hexoxy-2,5-dimethylbenzene
• CAS: 177217-27-5
• 化学式: C₁₄H₂₁BrO
• 分子量: 285.224
• InChiKey: IRMSAHMJNRFTOT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.6
• 重原子数：
  16
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1-Bromo-2,5-dimethyl-4-hexyloxy-benzene 在 N-溴代丁二酰亚胺(NBS) 、 偶氮二异丁腈 作用下， 以 四氯化碳 为溶剂， 生成 [5-Bromo-4-(diethoxy-phosphorylmethyl)-2-hexyloxy-benzyl]-phosphonic acid diethyl ester
  参考文献：
  名称：

  Excited States of Bromine-Substituted Distyrylbenzenes:  Models for Conjugated Polymer Emission

  摘要：

  Model 1,4-bis(styryl)benzene derivatives la,b related to poly(2-bromo-5-methoxy-1,4-phenylenevinylene) were synthesized to probe the effect of bromination on excited-state behavior of conjugated phenylenevinylene analogues. They showed solution absorption maxima at about 385 nm, without evidence of excimer formation up to 100 muM. Their fluorescence spectra showed overlapping bands at 435 and 460 run, with quantum yields in tetrahydrofuran of 0.16 and 0.21 for la and 1b, respectively. Excited-state transients were monitored by time-resolved laser flash spectroscopy at room temperature. The triplet states were characterized by absorption maxima at about 520-530 nm with lifetimes of about 0.6 mus, much longer than would be observed for prompt fluorescence states. The quantum yields of singlet to triplet-state intersystem crossing were determined to be 0.45 and 0.28 for la and 1b, respectively. The acceleration of triplet transient decay rates under increased oxygen pressure according to the Stern-Volmer law further supports the triplet-state assignments. The relatively high yields of intersystem crossing and low yields of fluorescence are attributed to a bromine-modulated heavy atom effect that enhances intersystem crossing between excited singlet and triplet states.

  DOI：

  10.1021/jp030041s
• 作为产物：
  描述：

  2,5-dimethyl-1-n-hexyloxy-benzene 、 溴 、 、 水 在 ice 、 aqueous solution 、 碳酸氢钠 作用下， 以 1,2-二氯乙烷 为溶剂， 以yielded 174 g of 4-bromo-2,5-dimethyl-n-hexyloxybenzene的产率得到1-Bromo-2,5-dimethyl-4-hexyloxy-benzene
  参考文献：
  名称：

  Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process

  摘要：

  一种化学扩增型光刻胶组合物，其中包含一种磺酰基重氮甲烷化合物作为光酸发生剂，其化学式为（1），其中R为H或C1-4烷基或烷氧基，G为SO2或CO，R3为C1-10烷基或C6-14芳基，p为1或2，q为0或1，p+q=2，n为0或1，m为3至11，k为0至4。该组合物适用于微细加工，特别是通过深紫外光刻技术，因为具有许多优点，包括提高分辨率和开发后提高图案轮廓。

  公开号：

  US06689530B2

文献信息

• Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
  申请人：——

  公开号：US20030180653A1

  公开（公告）日：2003-09-25

  A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C 1-4 alkyl or alkoxy, G is SO 2 or CO, R 3 is C 1-10 alkyl or C 6-14 aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development. 1

  一种化学放大型光刻胶组合物包含一种化学放大型光酸发生剂，其化学式为（1），其中R为H或C1-4烷基或烷氧基，G为SO2或CO，R3为C1-10烷基或C6-14芳基，p为1或2，q为0或1，p+q=2，n为0或1，m为3至11，k为0至4。该组合物适用于微细加工，尤其是通过深紫外光刻技术，因为具有许多优点，包括提高分辨率和在显影后改善图案轮廓。
• US6689530B2
  申请人：——

  公开号：US6689530B2

  公开（公告）日：2004-02-10
• Excited States of Bromine-Substituted Distyrylbenzenes:  Models for Conjugated Polymer Emission
  作者：Ananda M. Sarker、Yuji Kaneko、Paul M. Lahti、Frank E. Karasz

  DOI：10.1021/jp030041s

  日期：2003.8.1

  Model 1,4-bis(styryl)benzene derivatives la,b related to poly(2-bromo-5-methoxy-1,4-phenylenevinylene) were synthesized to probe the effect of bromination on excited-state behavior of conjugated phenylenevinylene analogues. They showed solution absorption maxima at about 385 nm, without evidence of excimer formation up to 100 muM. Their fluorescence spectra showed overlapping bands at 435 and 460 run, with quantum yields in tetrahydrofuran of 0.16 and 0.21 for la and 1b, respectively. Excited-state transients were monitored by time-resolved laser flash spectroscopy at room temperature. The triplet states were characterized by absorption maxima at about 520-530 nm with lifetimes of about 0.6 mus, much longer than would be observed for prompt fluorescence states. The quantum yields of singlet to triplet-state intersystem crossing were determined to be 0.45 and 0.28 for la and 1b, respectively. The acceleration of triplet transient decay rates under increased oxygen pressure according to the Stern-Volmer law further supports the triplet-state assignments. The relatively high yields of intersystem crossing and low yields of fluorescence are attributed to a bromine-modulated heavy atom effect that enhances intersystem crossing between excited singlet and triplet states.
• Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US06689530B2

  公开（公告）日：2004-02-10

  A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C1-4 alkyl or alkoxy, G is SO2 or CO, R3 is C1-10 alkyl or C6-14 aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development.

  一种化学扩增型光刻胶组合物，其中包含一种磺酰基重氮甲烷化合物作为光酸发生剂，其化学式为（1），其中R为H或C1-4烷基或烷氧基，G为SO2或CO，R3为C1-10烷基或C6-14芳基，p为1或2，q为0或1，p+q=2，n为0或1，m为3至11，k为0至4。该组合物适用于微细加工，特别是通过深紫外光刻技术，因为具有许多优点，包括提高分辨率和开发后提高图案轮廓。