Alkali-soluble siloxane polymer, silmethylene polymer, and
申请人:Hitachi, Ltd.
公开号:US04745169A1
公开(公告)日:1988-05-17
There are provided an alkali-soluble siloxane polymer, an alkali-soluble silmethylene polymer, and an alkali-soluble polyorganosilsesquioxane polymer. They are useful as a photoresist for the fabrication of semiconductor devices. They are suitable for dry etching because of their superior resistance to oxygen plasmas.