1-acetyl-3-methyl-imidazolium ion | 31399-05-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 英文名称: 1-acetyl-3-methyl-imidazolium ion
• 英文别名: N-Acetyl-N'-methylimidazolium；1-Acetyl-3-methylimidazolium；1-(3-Methylimidazol-3-ium-1-yl)ethanone
• CAS: 31399-05-0
• 化学式: C₆H₉N₂O
• 分子量: 125.15
• InChiKey: QCDVNFYOROSLKV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  25.9
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• BASE GENERATOR
  申请人：Eternal Chemical Co., Ltd.

  公开号：US20130172569A1

  公开（公告）日：2013-07-04

  The present invention provides a base generator having the structure of formula (1): wherein R 1 , R 2 , R 3 , R 4 , R 5 , and Y circle around (−)} are defined as in the specification. The base generator of the present invention can be used for imidization of a polyimide precursor, promoting crosslinking of epoxy monomers, or crosslinking of polyurethane or polyurea.

  本发明提供了一种具有公式（1）结构的碱发生器： 其中R1、R2、R3、R4、R5和Ycircle around (−)}如说明书中所定义。本发明的碱发生器可用于聚酰亚胺前体的酰亚胺化，促进环氧单体交联，或聚氨酯或聚脲的交联。
• NOVEL HETEROCYCLYL COMPOUNDS
  申请人：Aebi Johannes

  公开号：US20100016282A1

  公开（公告）日：2010-01-21

  The invention is concerned with novel heterocyclyl compounds of formula (I) wherein A, X, Y 1 , Y 2 , Y 3 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , m, n and p are as defined in the description and in the claims, as well as physiologically acceptable salts thereof. These compounds are antagonists of CCR2 receptor, CCR5 receptor and/or CCR3 receptor and can be used as medicaments.

  该发明涉及式(I)的新异环丙基化合物，其中A、X、Y1、Y2、Y3、R3、R4、R5、R6、R7、R8、R9、R10、m、n和p的定义如描述和索赔中所述，并且其生理上可接受的盐。这些化合物是CCR2受体、CCR5受体和/或CCR3受体的拮抗剂，可以用作药物。
• POLYIMIDE PRECURSOR COMPOSITION AND PREPARATION METHOD AND USE THEREOF
  申请人：Eternal Chemical Co., Ltd.

  公开号：US20130172494A1

  公开（公告）日：2013-07-04

  The present invention provides a polyimide precursor composition comprising a polyimide precursor and a thermal base generator having the structure of formula (1): wherein R 1 , R 2 , R 3 , R 4 , R 5 and Y ⊖ are as defined in the specification. The present invention also provides a polyimide prepared from the aforementioned precursor composition, and a preparation method thereof.
• POLYIMIDE PRECURSOR COMPOSITION AND USE THEREOF AND POLYIMIDE MADE THEREFROM
  申请人：ETERNAL MATERIALS CO., LTD.

  公开号：US20160369056A1

  公开（公告）日：2016-12-22

  The present disclosure relates to a polyimide precursor composition including an amic acid ester oligomer of formula (I): wherein r, R x , G, P and R are as defined in the specification. The polyimide made from the polyimide precursor composition of the present disclosure provides adhesion upon hot pressing such that a quasi double-sided two-layer metal clad laminate with an appropriate peeling strength or a double-sided two-layer metal clad laminate with a high peeling strength can be provided.
• Patterning Process with Silicon Mask Layer
  申请人：Taiwan Semiconductor Manufacturing Co., Ltd.

  公开号：US20180174828A1

  公开（公告）日：2018-06-21

  A lithography method is provided in accordance with some embodiments. The lithography method includes forming an under layer on a substrate; forming a silicon-containing middle layer on the under layer, wherein the silicon-containing middle layer has a thermal base generator (TBG) composite; forming a photosensitive layer on the silicon-containing middle layer; performing an exposing process to the photosensitive layer; and developing the photosensitive layer, thereby forming a patterned photosensitive layer.