申请人:Panasonic Corporation
公开号:EP2502926A1
公开(公告)日:2012-09-26
A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency.
本发明的一个问题是,在用光照射进行功能薄膜的精细图案化时,要防止被光照层下面的基底层的性质变坏,以及防止功能薄膜的性质变坏。解决该问题的方法是通过光照射将含有光敏性和可被光二聚化的基团以及具有冻干性的基团的化合物(A)和含有光敏性和可被光二聚化的基团以及具有憎液性的基团的化合物(B)二聚化而得到的化合物。