申请人:——
公开号:US20040063930A1
公开(公告)日:2004-04-01
A novel process for the removal of impurities from clavulanic acid using a selective adsorption material, in particular a molecularly imprinted polymer. Novel selective adsorption materials suitable for the process, and a process for the preparation of such selective adsorption materials, are also disclosed.
一种利用选择性吸附材料,特别是分子印迹聚合物去除克拉维酸中杂质的新工艺。还公开了适用于该工艺的新型选择性吸附材料,以及制备这种选择性吸附材料的工艺。