The present invention provides a base generator having the structure of formula (1):
wherein R
1
, R
2
, R
3
, R
4
, R
5
, and Y
circle around (−)}
are defined as in the specification. The base generator of the present invention can be used for imidization of a polyimide precursor, promoting crosslinking of epoxy monomers, or crosslinking of polyurethane or polyurea.
本发明提供了一种具有公式(1)结构的碱发生器:
其中R1、R2、R3、R4、R5和Ycircle around (−)}如说明书中所定义。本发明的碱发生器可用于聚酰亚胺前体的酰亚胺化,促进环氧单体交联,或聚氨酯或聚脲的交联。
PROCESS FOR PRODUCING AROMATIC POLYCARBOXYLIC ACID
申请人:Shibamoto Akihiro
公开号:US20110071314A1
公开(公告)日:2011-03-24
A process for producing an aromatic polycarboxylic acid in which all alkyl groups are converted into carboxyl groups in a high yield by decreasing a residual amount of an intermediate product is provided. The process comprises oxygen-oxidizing an aromatic compound having a plurality of alkyl groups (e.g., durene) in the presence of a catalyst containing a cyclic imino unit having an N—OR group (wherein R represents a hydrogen atom or a protecting group for a hydroxyl group) and a transition metal co-catalyst (e.g., a cobalt compound, a manganese compound, and a zirconium compound) under heating in a lower-temperature zone and a higher-temperature zone to produce an aromatic polycarboxylic acid in which a plurality of alkyl groups are oxidized into carboxyl groups. In an initial stage of the reaction, the reaction may be conducted in a first lower-temperature zone (a reaction temperature of 60 to 120° C. and a second lower-temperature zone (an intermediate temperature zone) (a reaction temperature of 100 to 140° C.); and then, in a latter stage of the reaction, the reaction may be conducted in a higher-temperature zone (a reaction temperature of 110 to 150° C.).
DIAMINE COMPOUND, AND HEAT-RESISTANT RESIN OR HEAT-RESISTANT RESIN PRECURSOR USING SAME
申请人:TORAY INDUSTRIES, INC.
公开号:US20170334837A1
公开(公告)日:2017-11-23
Provided are a photosensitive resin composition which has excellent pattern processabilities (high sensitivity and high resolution) and is excellent in chemical resistance and thermal resistance after thermally treated; a heat-resistant resin or heat-resistant resin precursor used for the composition; and a diamine compound which is a raw material of the resin and the precursor. The diamine compound is a diamine compound represented by a general formula (1).
Method of producing liquid crystal aligning layer, liquid crystal aligning layer produced using the same, and liquid crystal display including liquid crystal aligning layer
申请人:Kim Kyung-Jun
公开号:US20070128378A1
公开(公告)日:2007-06-07
Disclosed is a method of producing a liquid crystal aligning layer, a liquid crystal aligning layer produced using the same, and a liquid crystal display including the liquid crystal aligning layer. In the liquid crystal aligning layer that is produced using the method, ultraviolet rays are radiated on movable chains of a polyamic acid polymer while the polyamic acid polymer is not imidized to perform alignment, and heat treatment is then performed to conduct imidization. Thus, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
Disclosed is polyimide of the following Formula 1, a polyamic acid which is a precursor of the polyimide, and a method for preparing thereof.
In Formula 1, R is a tetravalent organic group, and n is an integer of 1 to 1000. A liquid crystal alignment layer which contains the polyimide according to the present invention has excellent thermal stability, no residual images, and excellent alignment of liquid crystals.