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2-(4-hydroxyphenyl)-2-(2',4'-dihydroxyphenyl)propane | 95742-41-9

中文名称
——
中文别名
——
英文名称
2-(4-hydroxyphenyl)-2-(2',4'-dihydroxyphenyl)propane
英文别名
4-[1-(4-hydroxyphenyl)-1-methyl-ethyl]-benzene-1,3-diol;4,6,4'-trihydroxy diphenyl dimethyl methane;2-(4-Hydroxyphenyl)-2-(2,4-dihydroxyphenyl)-propane;4-[2-(4-hydroxyphenyl)propan-2-yl]benzene-1,3-diol
2-(4-hydroxyphenyl)-2-(2',4'-dihydroxyphenyl)propane化学式
CAS
95742-41-9
化学式
C15H16O3
mdl
——
分子量
244.29
InChiKey
XJGTVJRTDRARGO-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.7
  • 重原子数:
    18
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.2
  • 拓扑面积:
    60.7
  • 氢给体数:
    3
  • 氢受体数:
    3

上下游信息

  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

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文献信息

  • Optically active compound and photosensitive resin composition
    申请人:——
    公开号:US20030211421A1
    公开(公告)日:2003-11-13
    A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
    一种光活性化合物与光敏剂结合使用,由以下公式(1)表示: A −[( J ) m −( X-Pro )] n (1) 其中,A代表至少包括一种从烃基和杂环基中选择的疏基的疏单元,J代表连接基团,X-Pro代表由光照可去除的保护基团Pro保护的亲基团,m代表0或1,n代表不少于1的整数。 保护基团Pro可以与光敏剂(特别是光酸发生剂)一起通过光照可去除,也可以是疏保护基团。亲基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性,用于光刻应用,因此,该光活性化合物有利于形成具有高分辨率的图案。
  • Hydroxylamine esters as polymerization initiators
    申请人:——
    公开号:US20030216494A1
    公开(公告)日:2003-11-20
    The invention relates to novel cyclic and open-chain hydroxylamine esters and polymerizable compositions comprising these hydroxylamine esters and an ethylenically unsaturated monomer or oligomer. The invention also relates to use as polymerization initiators and to the use of known hydroxylamine esters selected from the group consisting of HALS compounds and the novel hydroxylamine esters for the controlled degradation of polypropylene and for achieving a controlled increase in the molecular weight of polyethylene.
    该发明涉及新型环状和开链羟胺酯以及包括这些羟胺酯和乙烯基不饱和单体或寡聚物的可聚合组合物。该发明还涉及用作聚合引发剂以及用于控制聚丙烯降解和实现聚乙烯分子量控制增加的已知羟胺酯,所述羟胺酯来自HALS化合物和新颖羟胺酯的组合。
  • Organic Silicon-Based Compound And Method Of Producing The Same
    申请人:Kikuchi Taketoshi
    公开号:US20070203275A1
    公开(公告)日:2007-08-30
    Provided are an organic silicon compound of the following formula (I): (wherein, R 1 to R 20 represent each independently alkyl, alkoxy, aryloxy, cycloalkyl, alkylcycloalkyl, aryl, dialkylamino or the like, and the aryloxy and aryl may be substituted with a substituent selected from the group consisting of alkyl, alkoxy and alkoxyalkyl.) which can be used for suppression of coloration and thermal deterioration of an organic material in molding, and an organic material composition containing the organic silicon compound and a method of producing the organic silicon compound.
    提供以下式(I)的有机硅化合物:(其中,R1到R20分别独立表示烷基、烷氧基、芳氧基、环烷基、烷基环烷基、芳基、二烷基基或类似物,芳氧基和芳基可被从烷基、烷氧基和烷氧基中选择的取代基所取代。)该化合物可用于抑制有机材料在成型过程中的着色和热降解,以及含有该有机硅化合物的有机材料组合物和生产该有机硅化合物的方法。
  • [EN] USE OF 4-CYANO-NAPHTHALENE-1, 8-DICARBOXIMIDE DERIVATIVES AND RELATED COMPOUNDS TO PROTECT ORGANIC MATERIAL FROM THE DAMAGING EFFECTS OF LIGHT<br/>[FR] UTILISATION DE DERIVES 4-CYANO-NAPHTHALENE-1, 8-DICARBOXIMIDE ET COMPOSES ASSOCIES POUR LA PROTECTION DE MATIERE ORGANIQUE CONTRE LES EFFETS NUISIBLES DE LA LUMIERE
    申请人:BASF AG
    公开号:WO2005047265A1
    公开(公告)日:2005-05-26
    A description is given of the use of naphthalene-1,8-dicarboxylic monoimides of the formula (I), in which R1 is hydrogen, alkyl, alkenyl, cycloalkyl, cycloalkenyl, heterocycloalkyl, aryl or heteroaryl and R2 is a radical containing at least one π electron system containing a carbon atom and at least one further atom selected from carbon, oxygen, and nitrogen, with the proviso that the radical contains at least one atom other than carbon; to protect organic material from the damaging effects of light, of compositions which comprise at least one naphthalene-1,8-dicarboxylic monoimide of the formula (I) in an amount which provides protection from the damaging effects of light, and at least one organic material, and of new naphthalene-1,8-dicarboxylic monoimides (I).
    描述了使用式(I)的-1,8-二羧酸亚胺,其中R1是氢、烷基、烯基、环烷基、环烯基、杂环烷基、芳基或杂芳基,R2是一个含有至少一个π电子体系的基团,其中包含一个碳原子和至少一个来自碳、氧和氮的其他原子,但基团至少包含一个碳以外的原子;用于保护有机材料免受光的破坏作用的组合物的描述,该组合物包括至少一种式(I)的-1,8-二羧酸亚胺,其含量提供了对光的破坏作用的保护,以及至少一种有机材料,以及新的-1,8-二羧酸亚胺(I)。
  • COPOLYMERS AND COMPOSITIONS WITH ANTI-ADHESIVE AND ANTIMICROBIAL PROPERTIES
    申请人:BASF SE
    公开号:US20160235062A1
    公开(公告)日:2016-08-18
    The invention relates to a copolymer exhibiting both antimicrobial and anti-adhesive properties as well as to a hydrogel. Said hydrogel is obtained from the inventive copolymer and a substrate. Another part of the invention is a process for making the hydrogel, as well as different uses of the inventive copolymer as well as of the hydrogel.
    该发明涉及一种既具有抗菌和抗粘附性能的共聚物,又涉及一种凝胶。所述凝胶是由该创新共聚物和基质制得的。该发明的另一部分是制备凝胶的方法,以及该创新共聚物和凝胶的不同用途。
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