A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R
bd1
to R
bd3
each independently represent an aryl group which may have a substituent, provided that one or more of R
bd1
to R
bd3
are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X
−
represents a counter anion.
一种抗蚀组合物,含有基础材料组分,其在显影溶液中的溶解性由酸的作用和由化合物代表的公式(bd1)改变;在公式中,Rbd1到Rbd3各自独立地代表可能具有取代基的芳基,前提是Rbd1到Rbd3中的一个或多个是可能具有取代基的芳基,而这些芳基中至少有一个可能具有取代基的
氟代烷基与公式中与
硫原子相结合的碳原子相邻的碳原子结合,可能具有取代基的
氟代烷基的总数为2或更多;X−代表一个对离子。