1,4-Anthracendimethanol | 58791-47-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 1,4-Anthracendimethanol
• 英文别名: [4-(Hydroxymethyl)anthracen-1-yl]methanol
• CAS: 58791-47-2
• 化学式: C₁₆H₁₄O₂
• 分子量: 238.286
• InChiKey: ZOFHNURFNQUEQN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1,4-Anthracendimethanol 在 sodium hydroxide 、 氢溴酸 、 溶剂黄146 作用下， 生成 1,4-Bis-methylsulfanylmethyl-anthracene
  参考文献：
  名称：

  Gundermann,K.-D.; Roeker,K.-D., Justus Liebigs Annalen der Chemie, 1976, p. 140 - 152

  摘要：

  DOI：
• 作为产物：
  描述：

  9,10-dioxo-9,10-dihydro-1,4-anthracene dicarboxylic acid 在 盐酸 、 ammonium hydroxide 、 红铝 、 锌 作用下， 以 甲苯 为溶剂， 反应 1.0h， 生成 1,4-Anthracendimethanol
  参考文献：
  名称：

  1,4-Disubstituted Anthracene Antitumor Agents

  摘要：

  Three different types of 1,4-disubstituted anthracenes were synthesized, and their cytotoxicity in a panel of tumor cells was compared with that of the corresponding 9,10-disubstituted anthracenes. The panel contained human myeloma, melanoma, colon, and lung cancer cells and sensitive and multidrug-resistant murine L1210 leukemia cells. These compounds had [[(dimethylamino>ethyl]amino]methyl, N-[(dimethylamino)ethyl]carbamoyl, and carboxaldehyde (4,5-dihydro-1H-imidazol-2-yl)hydrazone side chains. The 1,4-diamide was more potent across the tumor panel than the corresponding 9,10-isomer, but the 1,4-diamine and the 1,4-hydrazone were less potent than their 9,10-isomers. Although the 1,Li-hydrazone was active against P388 leukemia in mice, it was inactive against L1210 leukemia. Within each pair of compounds, the one with greater average potency against tumor cells gave a greater increase in the transition melt temperature of DNA.

  DOI：

  10.1021/jm970308+

文献信息

• Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10042258B2

  公开（公告）日：2018-08-07

  This composition for forming an extreme-ultraviolet (EUV) or electron-beam upper-layer resist film including (a) a polymer (P) and (b) a solvent, the solvent containing 1 to 13 mass % of a C4-12 ketone compound with respect to the entire solvent, is used in the lithography process of a procedure for manufacturing a semiconductor device. Without needing to be intermixed with a resist, and particularly on the occasion of EUV exposure, the composition for forming an EUV or electron-beam upper-layer resist film blocks undesirable exposure light, e.g., ultraviolet (UV) or deep ultraviolet (DUV) rays, and selectively transmits only the EUV rays, and can be developed using a developing solution after exposure.

  这种用于形成极紫外（EUV）或电子束上层抗蚀剂薄膜的组合物包括（a）聚合物（P）和（b）溶剂，溶剂中的C4-12酮化合物占整个溶剂的1-13质量％，用于半导体设备制造过程中的光刻工艺。这种用于形成 EUV 或电子束上层抗蚀剂薄膜的组合物无需与抗蚀剂混合，尤其是在进行 EUV 曝光时，可阻挡不希望的曝光光（例如紫外线 (UV) 或深紫外线 (DUV)），并选择性地只透射 EUV 射线，曝光后可使用显影液进行显影。
• GUNDERMANN K.-D.; ROECKER K.-D., J. LIEBIGS ANN. CHEM. <JLAC-BF>, 1976, NO 1, 140-152
  作者：GUNDERMANN K.-D.、 ROECKER K.-D.

  DOI：——

  日期：——
• COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170205711A1

  公开（公告）日：2017-07-20

  This composition for forming an extreme-ultraviolet (EUV) or electron-beam upper-layer resist film including (a) a polymer (P) and (b) a solvent, the solvent containing 1 to 13 mass % of a C4-12 ketone compound with respect to the entire solvent, is used in the lithography process of a procedure for manufacturing a semiconductor device. Without needing to be intermixed with a resist, and particularly on the occasion of EUV exposure, the composition for forming an EUV or electron-beam upper-layer resist film blocks undesirable exposure light, e.g., ultraviolet (UV) or deep ultraviolet (DUV) rays, and selectively transmits only the EUV rays, and can be developed using a developing solution after exposure.
• COATING LIQUID FOR RESIST PATTERN COATING
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170293227A1

  公开（公告）日：2017-10-12

  There is provided a new coating liquid for resist pattern coating. A coating liquid for resist pattern coating comprising a component A that is a polymer including at least one hydroxy group or carboxy group; a component B that is a sulfonic acid of A-SO 3 H (where A is a linear or branched alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16, an aromatic group having at least one of the alkyl group or the fluorinated alkyl group as a substituent, or a C 4-16 alicyclic group optionally having a substituent); and a component C that is an organic solvent capable of dissolving the polymer and including ether or ketone compound of R 1 —O—R 2 and/or R 1 —C(═O)—R 2 (where R 1 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 3 to 16; and R 2 is a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16), a method of forming a resist pattern using the coating liquid, and a method for forming a reverse pattern using the coating liquid.
• US4163731A
  申请人：——

  公开号：US4163731A

  公开（公告）日：1979-08-07