The invention relates to a method for removing an alkyl sulfonyl or aryl sulfonyl protecting group from a primary or secondary amine by contacting an alkyl sulfonamide or an aryl sulfonamide with a Stage 0 or Stage I alkali metal-silica gel material in the presence of a solid proton source under conditions sufficient to form the corresponding amine. The invention also relates to a method for removing an alkyl sulfonyl or aryl sulfonyl protecting group from a primary or secondary amine by a) reacting an alkyl sulfonamide or an aryl sulfonamide with a Stage 0 or Stage I alkali metal-silica gel material, and b) subsequently reacting the reaction product from step a) with an electrophile or a proton source. Preferred Stage 0 or Stage I alkali metal-silica gel materials include Na, K
2
Na, and Na
2
K.
该发明涉及一种从一级或二级胺中去除烷基磺酰基或芳基磺酰基保护基的方法,方法包括将烷基磺酰胺或芳基磺酰胺与一种固体质子源接触,在足以形成相应胺的条件下,与0级或I级碱
金属-
硅胶材料反应。该发明还涉及一种从一级或二级胺中去除烷基磺酰基或芳基磺酰基保护基的方法,包括a)将烷基磺酰胺或芳基磺酰胺与0级或I级碱
金属-
硅胶材料反应,b)随后将步骤a)中的反应产物与亲电试剂或质子源反应。首选的0级或I级碱
金属-
硅胶材料包括Na、K2Na和Na2K。