Dipropargyl acetamide derivatives of following Formula 1 which are photoresist monomers, polymers thereof, and photoresist compositions containing the same. The photoresist polymer has high etching resistance, adhesiveness and post-exposure delay stability. As a result, the photoresist composition is suitable to form a fine pattern in a deep ultraviolet region.
1
wherein, n is an integer from 0 to 5.
以下公式1的双
丙炔基乙酰胺衍
生物是光阻单体,其聚合物和含有其的光阻组合物。光阻聚合物具有高蚀刻抗性、粘附性和后曝光延迟稳定性。因此,该光阻组合物适用于在深紫外区域形成细微图案。其中,n为0至5的整数。