4-[3-(2,3,4-Trihydroxyphenyl)propyl]benzene-1,2,3-triol | 10550-61-5

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 直链 1,3-二芳基丙烷
• 英文名称: 4-[3-(2,3,4-Trihydroxyphenyl)propyl]benzene-1,2,3-triol
• CAS: 10550-61-5
• 化学式: C₁₅H₁₆O₆
• 分子量: 292.288
• InChiKey: KSDBQJJQCLDPBY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  121
• 氢给体数：
  6
• 氢受体数：
  6

文献信息

• Photosensitive polymer composition, method for forming relief patterns, and electronic parts
  申请人：Hitachi Chemical DuPont MicroSystems Ltd.

  公开号：EP0961169A1

  公开（公告）日：1999-12-01

  Disclosed are a photosensitive polymer composition comprising (a) a polymer soluble in an aqueous alkaline solution, (b) an o-quinonediazide compound, and (c) a dissolution inhibitor for the component (a) in an aqueous alkaline solution; a method of using the composition for forming relief patterns; and electronic parts having, as a passivating film or an interlayer insulating film, the relief pattern as formed in the method. The composition has high sensitivity, and gives fine relief patterns having a good profile.

  本发明公开了一种光敏聚合物组合物，该组合物包含：(a) 可溶于碱性水溶液的聚合物；(b) 邻醌噻嗪化合物；(c) 成分(a)在碱性水溶液中的溶解抑制剂；使用该组合物形成浮雕图案的方法；以及电子零件，该电子零件具有在该方法中形成的浮雕图案，作为钝化膜或层间绝缘膜。该组合物具有高灵敏度，可形成具有良好轮廓的精细浮雕图案。
• Positive photosensitive resin composition, method of forming relief pattern, and electronic part
  申请人：Hitachi Chemical DuPont MicroSystems Ltd.

  公开号：EP1028354A1

  公开（公告）日：2000-08-16

  Positive photosensitive resin compositions, which comprise (A) a polyamidate having repetitive units of general formula (I) wherein R1 is a tetravalent organic group, R2 is a divalent organic group having a phenolic hydroxyl group, three R3 groups and three R4 groups each independently are an alkyl group or a hydrogen atom, and at least two R3 groups and at least two R4 groups are alkyl groups, and (B) a compound capable of generating an acid when exposed to light, are improved in storage stability and exposure sensitivity to i-line. Such compositions can improve the reliability of electronic parts when formed into surface-protecting films or interlayer insulating films by a method including exposure to i-line, development and heating.

  阳性光敏树脂组合物，它包括 (A) 具有通式(I)重复单元的聚酰胺化合物 其中 R1 为四价有机基团，R2 为具有酚羟基的二价有机基团，三个 R3 基团和三个 R4 基团各自独立地为烷基或氢原子，且至少两个 R3 基团和至少两个 R4 基团为烷基、 和 (B) 在光照下能生成酸的化合物，其贮存稳定性和光照敏感性均得到改善。当采用包括 i-线曝光、显影和加热的方法将此类组合物制成表面保护膜或层间绝缘膜时，可提高电子零件的可靠性。
• PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART
  申请人：Hitachi Chemical DuPont Microsystems Ltd.

  公开号：EP1708026A1

  公开（公告）日：2006-10-04

  A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R1 and R2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.

  一种光敏聚合物组合物包括 (a) 聚酰胺，其重复单元由以下通式 (I) 表示： 其中 U 代表四价有机基团，V 代表二价有机基团，p 是代表重复单元数目的整数；(b) 在接受光照时产生酸的化合物；和 (c) 由以下通式(II)代表的化合物： 其中 m 和 n 各自独立地为 1 或 2 的整数，Rs 各自独立地为氢、烷基或酰基，R1 和 R2 各自独立地代表具有 1 至 3 个碳原子的氟烷基。
• METHOD FOR PRODUCING POLYIMIDE FILM, POLYIMIDE FILM, POLYAMIDE ACID SOLUTION AND PHOTOSENSITIVE COMPOSITION
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：EP3406657A1

  公开（公告）日：2018-11-28

  A method for producing a polyimide film, comprising the steps of: obtaining a polyamic acid solution having a viscosity of 5 to 150 cps by preparing a raw material mixture liquid that contains a solvent, a tetracarboxylic dianhydride represented by a specific general formula, and an aromatic diamine represented by a specific general formula, and that has a total content of the tetracarboxylic dianhydride and the aromatic diamine of 15% by mass or less, and reacting the tetracarboxylic dianhydride and the aromatic diamine with each other in the raw material mixture liquid to form a polyamic acid having a repeating unit represented by a specific general formula; obtaining a polyimide-forming mixture liquid by adding a compound represented by a specific general formula to the polyamic acid solution; and obtaining a film made of a polyimide represented by a specific general formula by forming a film made of the polyimide-forming mixture liquid, followed by imidization of the polyamic acid in the film.

  一种生产聚酰亚胺薄膜的方法，包括以下步骤通过制备含有溶剂、特定通式表示的四羧酸二酐和特定通式表示的芳香族二胺的 原料混合物液体，获得粘度为 5 至 150 cps 的聚酰胺酸溶液、将原料混合物液体中的四羧酸二酐和芳香族二胺相互反应，生成具有特定通式所代表重复单元的聚酰胺；在聚酰胺溶液中加入特定通式表示的化合物，得到聚酰亚胺形成混合物液体；以及 利用聚酰亚胺形成混合物液体形成薄膜，然后将薄膜中的聚酰胺酰亚胺化，得到由特定通式表示的聚酰亚胺制成的薄膜。
• Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component
  申请人：Hitachi Chemical Co., Ltd.

  公开号：US10175577B2

  公开（公告）日：2019-01-08

  The invention provides a photosensitive resin composition comprising (A) an alkali-soluble resin having a phenolic hydroxyl group, (B) a compound that generates an acid by light, and (C) an acrylic resin having a group that crosslinks with the component (A), as well as a method for manufacturing a patterned cured film, and an electronic component prepared therewith.

  本发明提供了一种光敏树脂组合物，包括（A）具有酚羟基的碱溶性树脂、（B）在光照下产生酸的化合物和（C）具有与组分（A）交联的基团的丙烯酸树脂，以及制造图案化固化薄膜的方法和用其制备的电子元件。