bicyclo(2,2,1)hept-5-ene-2-carboxylic acid-t-pentyl ester | 398140-58-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: bicyclo(2,2,1)hept-5-ene-2-carboxylic acid-t-pentyl ester
• 英文别名: Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid, 1,1-dimethylpropyl ester；2-methylbutan-2-yl bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 398140-58-4
• 化学式: C₁₃H₂₀O₂
• 分子量: 208.301
• InChiKey: NYSHHHMEGJSBFF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  15
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.77
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  5-降冰片烯-2-羧酸 在 sodium hydroxide 作用下， 以 吡啶 、 水 、 对甲苯磺酰氯 为溶剂， 生成 bicyclo(2,2,1)hept-5-ene-2-carboxylic acid-t-pentyl ester
  参考文献：
  名称：

  Method for producing carboxylic acid tertiary alkyl ester

  摘要：

  通过持续添加具有单价酸基的酯化剂，该酯化剂可与三级醇交换酯基，到羧酸和三级醇的混合液中，可以高产率地得到高纯度的羧酸三级烷基酯（化学式1）。结果为R1（COOR2）n（1）。

  公开号：

  US20020055649A1

文献信息

• RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT
  申请人：Mitsui Chemicals, Inc.

  公开号：EP3693793A1

  公开（公告）日：2020-08-12

  Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G') curve and a loss modulus (G") curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30°C to 300°C, a heating rate of 3°C/min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40°C and lower than or equal to 200°.

  本发明提供了一种用于形成底层膜的树脂材料，该底层膜可用于形成多层光刻胶工艺中使用的光刻胶底层膜，该树脂材料包括环烯烃聚合物 (I)、其中，用于形成底层膜的树脂材料的固体粘弹性中的存储模量（G'）曲线和损失模量（G"）曲线的交点温度高于或等于 40°C，且低于或等于 200°C；该固体粘弹性是在测量温度范围为 30°C 至 300°C、加热速率为 3°C/min 和频率为 1 Hz 的条件下，在氮气环境中使用流变仪以剪切模式测得的。
• METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200115400A1

  公开（公告）日：2020-04-16

  The present invention provides a method for producing a silicon compound shown by the following general formula (3) through a hydrosilylation reaction between a hydrosilane compound shown by the following general formula (1) and a carbonyl group-containing alicyclic olefin compound shown by the following general formula (2), in which the hydrosilylation reaction takes place while an acidic compound or acidic compound precursor is gradually added in presence of a platinum-based catalyst. This provides a highly-efficient industrial method for producing an industrially useful, hydrolysable silicon compound having an alicyclic structure (particularly a norbornane ring) and a carbonyl group.
• RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE
  申请人：MITSUI CHEMICALS, INC.

  公开号：US20200241419A1

  公开（公告）日：2020-07-30

  Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G′) curve and a loss modulus (G″) curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30° C. to 300° C., a heating rate of 3° C./min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40° C. and lower than or equal to 200°.
• MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE
  申请人：MITSUI CHEMICALS, INC.

  公开号：US20200264511A1

  公开（公告）日：2020-08-20

  A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.
• US6492542B2
  申请人：——

  公开号：US6492542B2

  公开（公告）日：2002-12-10