2,8,14,20-Tetrakis(4-tert-butylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol | 929209-81-4

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,8,14,20-Tetrakis(4-tert-butylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
• CAS: 929209-81-4
• 化学式: C₆₈H₇₂O₈
• 分子量: 1017.31
• InChiKey: FUIYVQYMYHWFTC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  17.3
• 重原子数：
  76
• 可旋转键数：
  8
• 环数：
  9.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  162
• 氢给体数：
  8
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  对叔丁基苯甲醛 、 间苯二酚 在 盐酸 作用下， 以 乙醇 、 水 为溶剂， 反应 8.0h， 以65%的产率得到2,8,14,20-Tetrakis(4-tert-butylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
  参考文献：
  名称：

  Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator

  摘要：

  我们研究了四种分子玻璃（MG）材料，它们有望成为极紫外光（EUV）光刻的光刻胶。这些玻璃形成材料在纯材料和与（5%或10%）质量分数的光酸产生剂（PAG）三苯基全氟丁基磺酸鎓的混合物状态下，通过质子和13C固态核磁共振（NMR）技术进行了研究。13C技术提供了有关结晶度、纯度和多相定性存在的信息。质子研究侧重于使用自旋扩散来表征PAG和MG混合物的混合程度。这四种MG主要是芳香族材料，含有几个羟基，这些羟基部分被叔丁氧羰基（t-BOC）保护。在两种情况下，这一部分是可变的，并注意到对混合的影响。PAG从未被分离成富含PAG的大域；PAG总是分布均匀，并且估计了任何PAG聚集体的最大尺寸；然而，在某些情况下，PAG的平均局部浓度似乎会发生变化。结晶度仅与未衍生化的材料相关，这意味着PAG与任何衍生化MG的混合不受结晶的限制。还注意到，在四种未衍生化的材料中，有三种材料存在一些非常强的氢键，并且在用t-BOC部分衍生化时，这些氢键被消除或减弱。

  DOI：

  10.1039/b816290e

文献信息

• RADIATION-SENSITIVE COMPOSITION
  申请人：Echigo Masatoshi

  公开号：US20100047709A1

  公开（公告）日：2010-02-25

  A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition.
• US8110334B2
  申请人：——

  公开号：US8110334B2

  公开（公告）日：2012-02-07
• US8846292B2
  申请人：——

  公开号：US8846292B2

  公开（公告）日：2014-09-30
• Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator
  作者：David L. VanderHart、Vivek M. Prabhu、Anuja De Silva、Nelson M. Felix、Christopher K. Ober

  DOI：10.1039/b816290e

  日期：——

  We have examined four molecular glass (MG) materials that show promise as photoresists for extreme-ultraviolet (EUV) lithography. These glass-forming materials were investigated by proton and 13C solid state nuclear magnetic resonance (NMR) techniques in the bulk state as pure materials and as mixtures with (5 or 10) % by mass of the photoacid generator (PAG), triphenylsulfonium perfluorobutanesulfonate. The 13C techniques gave information about crystallinity, purity, and the qualitative existence of multiple phases. Proton studies focused on using spin diffusion to characterize the intimacy of mixing of the PAG and MG blends. The four MGs were largely aromatic materials containing several hydroxyl groups that were partially protected by t-butoxycarbonyl (t-BOC) groups. In two cases, this fraction was varied and the impact on mixing noted. Phase separation of the PAG into PAG-rich larger domains was never seen; the PAG was always finely distributed and the maximum size for any PAG clustering was estimated; however, in some cases, the average local concentration of PAG appeared to vary. Crystallinity was only seen associated with the underivatized materials implying that the mixing of the PAG with any derivatized MG was not restricted by crystallization. It was also noted that some very strong hydrogen bonds exist in three of the four underivatized materials and were eliminated or weakened upon partial derivatization with t-BOC.

  我们研究了四种分子玻璃（MG）材料，它们有望成为极紫外光（EUV）光刻的光刻胶。这些玻璃形成材料在纯材料和与（5%或10%）质量分数的光酸产生剂（PAG）三苯基全氟丁基磺酸鎓的混合物状态下，通过质子和13C固态核磁共振（NMR）技术进行了研究。13C技术提供了有关结晶度、纯度和多相定性存在的信息。质子研究侧重于使用自旋扩散来表征PAG和MG混合物的混合程度。这四种MG主要是芳香族材料，含有几个羟基，这些羟基部分被叔丁氧羰基（t-BOC）保护。在两种情况下，这一部分是可变的，并注意到对混合的影响。PAG从未被分离成富含PAG的大域；PAG总是分布均匀，并且估计了任何PAG聚集体的最大尺寸；然而，在某些情况下，PAG的平均局部浓度似乎会发生变化。结晶度仅与未衍生化的材料相关，这意味着PAG与任何衍生化MG的混合不受结晶的限制。还注意到，在四种未衍生化的材料中，有三种材料存在一些非常强的氢键，并且在用t-BOC部分衍生化时，这些氢键被消除或减弱。