Triethyl(4-phenylmethoxybutoxy)silane | 444816-12-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Triethyl(4-phenylmethoxybutoxy)silane
• 英文别名: triethyl(4-phenylmethoxybutoxy)silane
• CAS: 444816-12-0
• 化学式: C₁₇H₃₀O₂Si
• 分子量: 294.51
• InChiKey: LHXPIHKSMCXYGD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.01
• 重原子数：
  20
• 可旋转键数：
  11
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.65
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  Triethyl(4-phenylmethoxybutoxy)silane 在 iron(III) sulfate 作用下， 以 甲醇 为溶剂， 反应 0.6h， 以94%的产率得到4-苄氧基-1-丁醇
  参考文献：
  名称：

  Facile Cleavage of Silyl Protecting Groups with Catalytic Amounts of FeCl₃

  摘要：

  本文介绍了一种温和且环境友好的方法，使用催化量的铁离子在甲醇中去除硅烷保护基团。该方法特别有效地裂解了三乙基硅烷（TES）保护基团。

  DOI：

  10.1055/s-2006-926256
• 作为产物：
  描述：

  三乙基氯硅烷 、 4-苄氧基-1-丁醇 在 咪唑 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 反应 24.0h， 以83.7%的产率得到Triethyl(4-phenylmethoxybutoxy)silane
  参考文献：
  名称：

  Facile Cleavage of Triethylsilyl (TES) Ethers Using o-Iodoxybenzoic Acid (IBX) without Affecting tert-Butyldimethylsilyl (TBS) Ethers

  摘要：

  [GRAPHICS]In DMSO cleavage of triethylsilyl (TES) ethers by o-iodoxybenzoic acid (IBX) was significantly faster than cleavage of tart-butyldimethylsilyl (TBS) ethers or further oxidation into carbonyl compounds. In most cases, TES protecting groups could be removed in good to excellent yields within 1 h, whereas similar TBS protecting groups remained intact under the same conditions. The procedure also could be adapted for direct one-pot conversion of TES ethers into carbonyl compounds.

  DOI：

  10.1021/ol025946n

文献信息

• Facile Cleavage of Silyl Protecting Groups with Catalytic Amounts of FeCl₃
  作者：Yikang Wu、Yong-Qing Yang、Jia-Rong Cui、Lin-Gui Zhu、Ya-Ping Sun

  DOI：10.1055/s-2006-926256

  日期：——

  A very mild and environmentally benign method for ­removal of silyl protecting groups using catalytic amounts of iron ion in MeOH is presented. The method is particularly effective for cleaving triethylsilyl (TES) protecting groups.

  本文介绍了一种温和且环境友好的方法，使用催化量的铁离子在甲醇中去除硅烷保护基团。该方法特别有效地裂解了三乙基硅烷（TES）保护基团。
• Facile Cleavage of Triethylsilyl (TES) Ethers Using <i>o</i>-Iodoxybenzoic Acid (IBX) without Affecting <i>tert</i>-Butyldimethylsilyl (TBS) Ethers
  作者：Yikang Wu、Jia-Hui Huang、Xin Shen、Qi Hu、Chao-Jun Tang、Liang Li

  DOI：10.1021/ol025946n

  日期：2002.6.1

  [GRAPHICS]In DMSO cleavage of triethylsilyl (TES) ethers by o-iodoxybenzoic acid (IBX) was significantly faster than cleavage of tart-butyldimethylsilyl (TBS) ethers or further oxidation into carbonyl compounds. In most cases, TES protecting groups could be removed in good to excellent yields within 1 h, whereas similar TBS protecting groups remained intact under the same conditions. The procedure also could be adapted for direct one-pot conversion of TES ethers into carbonyl compounds.
• The use of organophotoacids for deprotection reactions in organic synthesis
  作者：Yuichi Nishikubo、Shinya Kanzaki、Shuichi Matsumura、Kazunobu Toshima

  DOI：10.1016/j.tetlet.2006.09.028

  日期：2006.11

  o-Hydroxymethylphenol was found to be an effective and environmentally benign organophotoacid. An increased acidity in the excited state, induced by photoirradiation, was sufficient for the deprotection of several protecting groups which are widely used in organic synthesis. (c) 2006 Elsevier Ltd. All rights reserved.