2-(3,4-Dihydroxyphenyl)-2H-1-benzopyran-3,5,7-triol | 24562-01-4

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 黄酮类化合物
• 英文名称: 2-(3,4-Dihydroxyphenyl)-2H-1-benzopyran-3,5,7-triol
• 英文别名: 2-(3,4-dihydroxyphenyl)-2H-chromene-3,5,7-triol
• CAS: 24562-01-4
• 化学式: C₁₅H₁₂O₆
• 分子量: 288.25
• InChiKey: LPCQERDETYPGEY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  21
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  110
• 氢给体数：
  5
• 氢受体数：
  6

文献信息

• NOVEL APPROACH FOR SYNTHESIS OF CATECHINS
  申请人：SPHAERA PHARMA PVT. LTD.

  公开号：US20150368223A1

  公开（公告）日：2015-12-24

  A process for synthesis of enatiomerically pure or enatiomerically enriched or racemic mixture of (+and/or−) epicatechin echm and its intermediates, comprising the steps of: (i) obtaining penta-protected quercetin; (ii) reducing the penta-protected quercetin obtained from step (i); (iii) optionally deprotecting the compound of step (ii); (iv) reducing the compound obtained from step (ii) or step (iii) in the presence of a chiral/achiral reducing agent to obtain a chiral intermediate; (v) deprotecting and/or hydrogenation of the chiral intermediate obtained from step (iv) to obtain (−)-epicatechin; (vi) optionally simultaneously deprotecting and by drogenation of the compound obtained from step (ii) to obtain racemic epicatechin.

  一种合成纯对映体或对映体富集或混合物（+和/或−）表儿茶素ECHM及其中间体的方法，包括以下步骤：（i）获得五保护基槲皮素；（ii）还原从步骤（i）获得的五保护基槲皮素；（iii）可选地去保护步骤（ii）中的化合物；（iv）在手性/非手性还原剂的存在下还原从步骤（ii）或步骤（iii）获得的化合物以获得手性中间体；（v）去保护和/或氢化从步骤（iv）获得的手性中间体以获得（−）-表儿茶素；（vi）可选地同时去保护和氢化从步骤（ii）获得的化合物以获得外消旋表儿茶素。
• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445680A2

  公开（公告）日：1991-09-11

  A positive type photoresist composition which is superior in the prevention of pattern break and scumming during development, comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein said novolak resin is a condensate of a mixture of m-cresol and p-cresol with at least one of formaldehyde, formaldehyde polymer and formaldehyde precursor and wherein the relationship between X = A/(A+B+C) and the content of m-cresol in said novolak resin falls within the shaded part (including the straight lines surrounding this part) in Figure 1, said A representing an integrated value of peak area between 23.0 ppm and 31.0 ppm , B representing an integrated value of peak area between 31.0 ppm and 34.0 ppm and C representing an integrated value of peak area between 34.0 ppm and 37.0 ppm in a ¹³C-NMR spectrum of a dimethyl sulfoxide-d₆ solution of said novolak resin.

  一种正型光刻胶组合物，在显影过程中可有效防止图案破裂和浮渣，该组合物由碱溶性酚醛树脂和 1,2-醌噻嗪化合物组成，其中所述酚醛树脂是间甲酚和对甲酚与甲醛、甲醛聚合物和甲醛前体中至少一种的混合物的缩合物、其中，X = A/(A+B+C) 与间甲酚在所述酚醛树脂中的含量之间的关系在图 1 中的阴影部分（包括围绕该部分的直线）内，所述 A 代表峰面积的综合值，介于 23.在所述酚醛树脂的二甲亚砜-d₆溶液的¹³C-NMR 光谱中，A 代表峰面积的综合值在 23.0 ppm 和 31.0 ppm 之间，B 代表峰面积的综合值在 31.0 ppm 和 34.0 ppm 之间，C 代表峰面积的综合值在 34.0 ppm 和 37.0 ppm 之间。
• Positive photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0555861B1

  公开（公告）日：1998-11-11
• US5318875A
  申请人：——

  公开号：US5318875A

  公开（公告）日：1994-06-07
• US5360692A
  申请人：——

  公开号：US5360692A

  公开（公告）日：1994-11-01