Provided are an organic semiconductor material that can be subjected to a welding process and allows a stable n-type transistor operation even in an atmosphere, an organic semiconductor device using the same, and their production methods. The organic semiconductor material includes a compound represented by the general formula (1):
where each of R1 through R4 independently is an atom or functional group selected from the group consisting of (i) a hydrogen atom, (ii) a halogen atom, (iii) an alkyl group in which one or more carbon atoms may be substituted by an oxygen atom and/or a sulfur atom and in which one or more hydrogen atoms may be substituted by a halogen atom, (iv) an alkyloxy group, (v) an alkylthio group, (vi) an aryl group, and (vii) an alkyl group in which one or more hydrogen atoms are substituted by an aryl group; each of R5 and R6 independently is a sulfur atom or a selenium atom; and a, b, and c are integers.
本发明提供了一种可进行焊接处理且即使在大气中也能使 n 型晶体管稳定工作的有机半导体材料、一种使用该材料的有机半导体器件及其生产方法。有机半导体材料包括通式(1)所代表的化合物:
其中 R1 至 R4 各自独立地为选自以下组别的原子或官能团:(i) 氢原子;(ii) 卤素原子;(iii) 一个或多个碳原子可被氧原子和/或
硫原子取代且一个或多个氢原子可被卤素原子取代的烷基;(iv) 烷氧基;(v) 烷
硫基;(vi) 芳基;(vii) 一个或多个氢原子被芳基取代的烷基;R5 和 R6 各自独立地为
硫原子或
硒原子;以及 a、b 和 c 为整数。