An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.
提供一种
化学式为(1)的盐类,作为酸扩散
抑制剂,并提供一种
化学增强型光刻胶组合物,其中包括该酸扩散
抑制剂。当通过光刻技术进行加工时,该光刻胶组合物形成的图案具有最小的缺陷和出色的光刻性能因子,如CDU、LWR和DOF。