2-nitrobenzohydroxamic acid | 17512-68-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-nitrobenzohydroxamic acid
• 英文别名: N-hydroxy-2-nitrobenzamide；2-nitro-benzohydroxamic acid；2-Nitro-benzohydroxamsaeure；o-Nitro-benzhydroxamsaeure；2-Nitrobenzenecarbohydroxamic acid
• CAS: 17512-68-4
• 化学式: C₇H₆N₂O₄
• mdl: MFCD09937120
• 分子量: 182.136
• InChiKey: LGEVIFOJNNPCNI-UHFFFAOYSA-N

物化性质

• 密度：
  1.485±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -0.3
• 重原子数：
  13
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  95.2
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-nitrobenzohydroxamic acid 在 乙酸酐 、 potassium carbonate 、 盐酸 作用下， 以 二甲基亚砜 、 水 为溶剂， 反应 2.0h， 以68%的产率得到2-硝基苯胺
  参考文献：
  名称：

  在温和条件下由催化量的活化剂诱导的自传播洛森重排

  摘要：

  已经开发了在中等至高极性有机溶剂中由催化量的活化剂引起的温和的自蔓延的洛森重排。在催化量（0.01当量）的乙酸酐和等摩尔量的碱（如干燥的碳酸钾）的存在下，芳族和脂族异羟肟酸的重排可以高收率得到相应的胺。传统Lossen重排的替代方法为从游离异羟肟酸合成胺提供了一种简单温和的方法。

  DOI：

  10.1016/j.tetlet.2014.12.084
• 作为产物：
  描述：

  2-硝基苯甲酸甲酯 在 盐酸 、 羟胺 、 sodium methylate 作用下， 生成 2-nitrobenzohydroxamic acid
  参考文献：
  名称：

  Synthesis of a Series of Vicinally Substituted Hydroxamic Acids¹

  摘要：

  DOI：

  10.1021/ja01567a069

文献信息

• [EN] IMIDAZOLINE DERIVATIVES AS ALPHA-1A ADRENOCEPTOR LIGANDS<br/>[FR] DERIVES D'IMIDAZOLINE UTILISES COMME LIGANDS DU RECEPTEUR ADRENERGIQUE ALPHA-1A
  申请人：GLAXO GROUP LTD

  公开号：WO2000066563A1

  公开（公告）日：2000-11-09

  Compound of formula (I) or a pharmaceutically acceptable salt or solvate thereof are disclosed. Formula (i) wherein R?2, R3, R4 and R5¿ are independently H, halogen, -OH, -C¿1-3?alkyl, -C1-3alkoxy, -SC1-2alkyl, or -CF3, with the proviso that at least 2 of R?2, R3, R4 and R5¿ are H; R6 is H or -CH¿3; R?1 is -S(O)¿nR?7 where n is 1 or 2, -S(O)¿2NHR?8, -C(O)R?9, -NR14R15, -C(R17)=NOR16¿, (a) or a 5,6, or 7 membered heteroalkyl or heteroaryl group optionally substituted. Such compounds are useful in the treatment of Alpha-1A mediated diseases or conditions such as urinary incontinence.

  公开了式(I)的化合物或其药学上可接受的盐或溶剂化物。式(I)中，R?2、R3、R4和R5¿独立地为H、卤素、-OH、-C¿1-3?烷基、-C1-3烷氧基、-SC1-2烷基或-CF3，但至少有2个R?2、R3、R4和R5¿为H；R6为H或-CH¿3；R?1为-S(O)¿nR?7，其中n为1或2，-S(O)¿2NHR?8，-C(O)R?9，-NR14R15，-C(R17)=NOR16¿，(a)或可选择取代的5、6或7成员杂烷基或杂芳基基团。这些化合物在治疗α-1A介导的疾病或病况，例如尿失禁方面有用。
• Ortho-heterocyclic substituted aryl amides for controlling invertebrate pests
  申请人：Clark David Alan

  公开号：US20080132524A1

  公开（公告）日：2008-06-05

  This invention pertains to compounds of Formula I, their N-oxides and suitable salts wherein A is O or S; G is a 5- or 6-membered heteroaromatic ring or a 5- or 6-membered nonaromatic heterocyclic ring optionally including one or two ring members selected from the group consisting of C(═O), SO or S(O) 2 , each ring optionally substituted with from one to four R 2 ; each J is independently a phenyl ring, a 5- or 6-membered heteroaromatic ring or an aromatic 8-, 9- or 10-membered fused carbobicyclic or heterobicyclic ring system, wherein each ring or ring system is optionally substituted with from one to four R 3 ; and R 1 , R 2 , R 3 , R 4 and n are as defined in the disclosure. A composition comprising a compound of Formula I, and a method for controlling an invertebrate pest comprising contacting the invertebrate pest or its environment with a biologically effective amount of a compound of Formula I are also disclosed.

  本发明涉及式I的化合物、它们的N-氧化物和适当的盐，其中A为O或S；G为5-或6-成员杂芳环或5-或6-成员非芳杂环，可选地包括来自C(═O)、SO或S(O)2的一个或两个环成员，每个环可选地用1至4个R2取代；每个J独立地为苯环、5-或6-成员杂芳环或芳香8-、9-或10-成员融合的碳双环或杂双环系统，其中每个环或环系统可选地用1至4个R3取代；而R1、R2、R3、R4和n如说明书所定义。本发明还揭示了一种包含式I化合物的组合物，以及一种控制无脊椎动物害虫的方法，包括与式I化合物的生物有效量接触无脊椎动物害虫或其环境。
• Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
  申请人：BASF SE

  公开号：EP2428541A1

  公开（公告）日：2012-03-14

  An aqueous polishing composition has been found, the said aqueous polishing composition comprising (A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility; (B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and (C) at least one anionic phosphate dispersing agent; and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.

  发现了一种水性抛光组合物，所述水性抛光组合物包括 (A) 至少一种磨料颗粒，分散在不含组分（B）的水介质中时带正电，从电泳迁移率看，其 pH 值在 3 至 9 之间； (B) 至少一种水溶性聚合物，选自由线性和支链环氧亚烷基均聚物和共聚物组成的 组；以及 (C) 至少一种阴离子磷酸盐分散剂； 以及一种利用该水性抛光组合物对电气、机械和光学设备的基底材料进行抛光的工艺。
• Method of polishing a silicon-containing dielectric
  申请人：Cabot Microelectronics Corporation

  公开号：US20040152309A1

  公开（公告）日：2004-08-05

  The invention is directed to a method of polishing a silicon-containing dielectric layer involving the use of a chemical-mechanical polishing system comprising (a) an inorganic abrasive, (b) a polishing additive, and (c) a liquid carrier, wherein the polishing composition has a pH of about 4 to about 6. The polishing additive comprises a functional group having a pK a of about 4 to about 9 and is selected from the group consisting of arylamines, aminoalcohols, aliphatic amines, heterocyclic amines, hydroxamic acids, aminocarboxylic acids, cyclic monocarboxylic acids, unsaturated monocarboxylic acids, substituted phenols, sulfonamides, thiols, salts thereof, and combinations thereof. The invention is further directed to the chemical-mechanical polishing system, wherein the inorganic abrasive is ceria.

  本发明涉及一种对含硅介电层进行抛光的方法，该方法涉及使用一种化学机械抛光系统，该系统包括(a)一种无机磨料、(b)一种抛光添加剂和(c)一种液体载体，其中抛光组合物的 pH 值约为 4 至 6。 a 为约 4 至约 9 的官能团，该官能团选自由芳胺、氨基醇、脂肪胺、杂环胺、羟肟酸、氨基羧酸、环状单羧酸、不饱和单羧酸、取代酚、磺酰胺、硫醇、其盐及其组合组成的组。本发明还涉及化学机械抛光系统，其中无机磨料为铈。
• Readily deinkable toners
  申请人：Carter W. Phillip

  公开号：US20060196848A1

  公开（公告）日：2006-09-07

  The invention is directed to a method of polishing a silicon-containing dielectric layer involving the use of a chemical-mechanical polishing system comprising (a) an inorganic abrasive, (b) a polishing additive, and (c) a liquid carrier, wherein the polishing composition has a pH of about 4 to about 6. The polishing additive comprises a functional group having a pK a of about 3 to about 9 and is selected from the group consisting of arylamines, aminoalcohols, aliphatic amines, heterocyclic amines, hydroxamic acids, aminocarboxylic acids, cyclic monocarboxylic acids, unsaturated monocarboxylic acids, substituted phenols, sulfonamides, thiols, salts thereof, and combinations thereof. The invention is further directed to the chemical-mechanical polishing system, wherein the inorganic abrasive is ceria.

  本发明涉及一种对含硅介电层进行抛光的方法，该方法涉及使用一种化学机械抛光系统，该系统包括(a)一种无机磨料、(b)一种抛光添加剂和(c)一种液体载体，其中抛光组合物的 pH 值约为 4 至 6。 a 为约 3 至约 9 的官能团，该官能团选自由芳胺、氨基醇、脂肪胺、杂环胺、羟肟酸、氨基羧酸、环状单羧酸、不饱和单羧酸、取代酚、磺酰胺、硫醇、其盐及其组合组成的组。本发明还涉及化学机械抛光系统，其中无机磨料为铈。