MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150323865A1
公开(公告)日:2015-11-12
A polymer for resist use is obtainable from a monomer having formula (1) wherein R
1
is H, CH
3
or CF
3
, R
2
and R
3
each are H or a monovalent hydrocarbon group, X
1
is a divalent hydrocarbon group, k
1
=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.
Single enantiomer synthesis of α-(trifluoromethyl)-β-lactam
作者:Václav Jurčík、Alexandra M Z Slawin、David O'Hagan
DOI:10.3762/bjoc.7.86
日期:——
from alpha-(trifluoromethyl)acrylic acid (2). Conjugate addition of alpha-(p-methoxyphenyl)ethylamine ((S)-3b), generated an addition adduct 4b which was cyclised to beta-lactam 5b. Separation of the diastereoisomers by chromatography gave ((alphaS,3S)-5b). N-Debenzylation afforded the desired alpha-(trifluoromethyl)-beta-lactam ((S)-1). The absolute stereochemistry of diastereoisomers 5 was determined