A polymer for resist use is obtainable from a monomer having formula (1) wherein R
1
is H, CH
3
or CF
3
, R
2
and R
3
each are H or a monovalent hydrocarbon group, X
1
is a divalent hydrocarbon group, k
1
=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.
可以从具有式(1)的单体获得用于抗蚀的聚合物,其中R1为H、
CH3或
CF3,R2和R3各自为H或一价碳氢基团,X1为二价碳氢基团,k1=0或1,Z形成5或6元脂环。包含该聚合物的抗蚀组合物具有货架稳定性,显示高溶解对比度,控制酸扩散和低粗糙度,在碱性显影和有机溶剂显影过程中表现出色。