and to inhibit ERKs phosphorylation, without acting directly on microtubules and tubuline. Its theoretical recognition against duplex and quadruplexDNA structures have been compared to experimental thermodynamic measurements and by molecular modeling investigation leading to putative binding modes. Taken together these findings contribute to define this compound as potential Multitarget-Directed Ligands
[EN] S-TRIAZINE COMPOUNDS CONTAINING ONE AMINOSILOXANE GROUP AND TWO PARTICULAR PARA-AMINOBENZALMALONATE GROUPS; COSMETIC COMPOSITIONS CONTAINING SAID DERIVATIVES; USES OF SAID S-TRIAZINE DERIVATIVES<br/>[FR] COMPOSÉS DE S-TRIAZINE CONTENANT UN GROUPE AMINOSILOXANE ET DEUX GROUPES PARA-AMINOBENZALMALONATE PARTICULIERS ; COMPOSITIONS COSMÉTIQUES CONTENANT LESDITS DÉRIVÉS ; UTILISATIONS DESDITS DÉRIVÉS DE S-TRIAZINE
申请人:OREAL
公开号:WO2009074409A1
公开(公告)日:2009-06-18
The invention concerns novel s-triazine compounds containing one aminosiloxane group and two particular para-aminobenzalmalonate groups. The invention also concerns cosmetic or dermatological compositions intended for the photoprotection of keratinous materials, comprising at least one s-triazine compound containing one aminosiloxane group and two particular grafted para-aminobenzalmalonate groups in a cosmetically acceptable medium. The invention also concerns the use of at least one s-triazine compound containing one aminosiloxane group and two particular grafted para-aminobenzalmalonate groups in a cosmetic composition, as an agent for filtering for UV-A radiation.
[EN] DITHIOLANE COMPOUNDS; COMPOSITIONS CONTAINING THEM; USES FOR PHOTOPROTECTING THE SKIN<br/>[FR] COMPOSÉS DE DITHIOLANE ; COMPOSITIONS LES CONTENANT, LEURS UTILISATIONS POUR LA PHOTOPROTECTION DE LA PEAU
申请人:OREAL
公开号:WO2010040603A1
公开(公告)日:2010-04-15
The present invention relates to novel dithiolane compounds of formula (I) below: formula (I), in which Y denotes 0, NR1 or S; R1 denotes a hydrogen atom; a saturated linear C1-C20 or branched C3-C20 or unsaturated C2-C20 alkyl hydrocarbon- based group; an aryl group optionally substituted with one or more hydroxyls and/or with one or more C1-C8 alkoxy radicals; R denotes a hydrogen atom; a saturated linear C1-C20 or branched C3-C20 or unsaturated C2-C20 alkyl hydrocarbon- based group; a radical having the following formula (Ia), in which n = 0, 1, 2, 3 or 4; x = 0, 1, 2 or 3 and R3, which may be identical or different, denote a hydrogen atom or a linear or branched C1-C4 alkyl such as methyl, ethyl or isopropyl; the radical 4-methyl dithiolane when Y denotes NH; when Y denotes NHR1 and R1 is other than hydrogen, R and Ri may form a ring. The invention also relates to the uses of these compounds for reinforcing the natural antioxidant protection of the skin against oxidative stress caused especially by UV radiation.