申请人:——
公开号:US20030130148A1
公开(公告)日:2003-07-10
Cleaning solutions for removing photoresist resins and a method of forming patterns using the same are disclosed. The cleaning solution includes water (H
2
O) as main component, one or more surfactants as additive selected from the group consisting of polyoxyalkylene compounds, a salt of alcohol amine of Formula 1 and hydrocarbon compounds having carboxylic acid (—COOH) group, a salt of alcohol amine of Formula 1 and hydrocarbon compounds having sulfonic acid (—SO
3
H) group, polyethylene glycol compounds, compounds of Formula 3, compounds having a molecular weight ranging from 1000 to 10000 including repeating unit of Formula 4, polyether denatured silicon compounds and alcohol compounds.
1
wherein R
1
, R
2
, R
3
, R
4
, R
5
, A, l and n are defined in the specification.
本发明公开了用于去除光致抗蚀剂树脂的清洁溶液以及使用该清洁溶液形成图案的方法。清洁液包括水(H
2
O)作为主要成分,一种或多种表面活性剂作为添加剂,这些添加剂选自聚氧烷基化合物、式 1 的醇胺盐和具有羧酸(-COOH)基团的烃化合物、式 1 的醇胺盐和具有磺酸(-SO
3
H)基团的烃化合物的盐、聚乙二醇化合物、式 3 化合物、分子量介于 1000 至 10000 之间(包括式 4 的重复单元)的化合物、聚醚变性硅化合物和醇化合物。
1
其中 R
1
, R
2
, R
3
, R
4
, R
5
A、l 和 n 的定义见说明书。