Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy, R.sub.2 is hydrogen, alkyl, cycloalkyl or aryl, R.sub.3 is a saturated or unsaturated hydrocarbon radical, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, alkyl, alkoxy or aryloxy, and X is a direct single bond or a methylene or ethylene bridge. These compounds are especially suitable for the preparation of photoresist compositions which can be used both for the production of positive as well as negative images. The photoresists are preferably used for deep-UV microlithography.
含有至少一个芳香环系的非聚合物化合物,其携带一个或多个式I的
四氢吡喃氧基取代基:##STR1##其中R.sub.1是氢、卤素、烷基、环烷基、芳基、烷氧基或芳氧基,R.sub.2是氢、烷基、环烷基或芳基,R.sub.3是饱和或不饱和的碳氢基团,R.sub.4和R.sub.5分别独立地是氢、卤素、烷基、烷氧基或芳氧基,X是直接单键或亚甲基或
乙烯基桥。这些化合物特别适用于制备可用于正像和负像的光阻组合物。光阻最好用于深紫外微影术。