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2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo-[19.3.1.13,7.115,19]octacosal(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol | 176897-13-5

中文名称
——
中文别名
——
英文名称
2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo-[19.3.1.13,7.115,19]octacosal(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
英文别名
2,8,14,20-tetra(4-hydroxyphenyl)calix[4]resorcinarene;tetra(4-hydroxyphenyl)calix[4]resorcinarene;tetra(p-hydroxyphenyl)calix[4]resorcinarene;C-4-hydroxyphenylcalix[4]resorcinarene;tetra(p-hydroxyphenyl)resorcarene;2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo[19.3.3.33,7.19,13.115,19]octosa-1(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaen-4,6,10,12,16,18,22,24-octol;6,6'-[(4,6-Dihydroxy-m-phenylene)bis[(4-hydroxyphenyl)methylene]]-[4,4'-[(4,6-dihydroxy-m-phenylene)bis[(4-hydroxyphenyl)methylene]]bis(benzene-1,3-diol)];2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo-[19.3.1.1<sup>3,7</sup>.1<sup>15,19</sup>]octacosal(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol化学式
CAS
176897-13-5
化学式
C52H40O12
mdl
——
分子量
856.882
InChiKey
WQMHDKXCEBMUSJ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    9.2
  • 重原子数:
    64
  • 可旋转键数:
    4
  • 环数:
    9.0
  • sp3杂化的碳原子比例:
    0.08
  • 拓扑面积:
    243
  • 氢给体数:
    12
  • 氢受体数:
    12

反应信息

  • 作为反应物:
    描述:
    2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo-[19.3.1.13,7.115,19]octacosal(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol环氧溴丙烷caesium carbonate 作用下, 以 N-甲基吡咯烷酮 为溶剂, 反应 48.0h, 以75%的产率得到2-[[6,10,12,16,18,22,24-Heptakis(oxiran-2-ylmethoxy)-2,8,14,20-tetrakis[4-(oxiran-2-ylmethoxy)phenyl]-4-pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaenyl]oxymethyl]oxirane
    参考文献:
    名称:
    新的大折射率变化材料:含有降冰片二烯部分的杯芳烃衍生物的合成和光化学价异构化
    摘要:
    我们已经研究了基于杯芳烃 [对叔丁基杯[8] 芳烃 (BCA)、对甲基杯[6] 芳烃 (MCA)、杯[4] 间苯二酚的具有侧降冰片二烯 (NBD) 部分的环状低聚物的合成(CRA)、2,8,14,20-四癸基杯]4]间苯二酚 (CRA 1 0 ) 和 2,8,14,20-四(对羟基苯基)杯[4] 间苯二酚 (CRA ph )] . 得到的含有 NBD 部分的杯芳烃衍生物的光化学价异构化进行得非常顺利,得到相应的四环 (QC) 部分,并且发现光异构化前后的折射率变化很大(An's = 0.028-0.061)。
    DOI:
    10.1246/bcsj.77.1415
  • 作为产物:
    描述:
    对羟基苯甲醛间苯二酚盐酸 作用下, 以 乙醇 为溶剂, 反应 8.0h, 以75%的产率得到2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo-[19.3.1.13,7.115,19]octacosal(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
    参考文献:
    名称:
    Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator
    摘要:
    我们研究了四种分子玻璃(MG)材料,它们有望成为极紫外光(EUV)光刻的光刻胶。这些玻璃形成材料在纯材料和与(5%或10%)质量分数的光酸产生剂(PAG)三苯基全氟丁基磺酸鎓的混合物状态下,通过质子和13C固态核磁共振(NMR)技术进行了研究。13C技术提供了有关结晶度、纯度和多相定性存在的信息。质子研究侧重于使用自旋扩散来表征PAG和MG混合物的混合程度。这四种MG主要是芳香族材料,含有几个羟基,这些羟基部分被叔丁氧羰基(t-BOC)保护。在两种情况下,这一部分是可变的,并注意到对混合的影响。PAG从未被分离成富含PAG的大域;PAG总是分布均匀,并且估计了任何PAG聚集体的最大尺寸;然而,在某些情况下,PAG的平均局部浓度似乎会发生变化。结晶度仅与未衍生化的材料相关,这意味着PAG与任何衍生化MG的混合不受结晶的限制。还注意到,在四种未衍生化的材料中,有三种材料存在一些非常强的氢键,并且在用t-BOC部分衍生化时,这些氢键被消除或减弱。
    DOI:
    10.1039/b816290e
  • 作为试剂:
    描述:
    1,3-环己二酮丁炔二酸二乙酯丙二腈2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo-[19.3.1.13,7.115,19]octacosal(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol 作用下, 以 为溶剂, 反应 10.0h, 以73%的产率得到diethyl 3-amino-4-cyano-5,6,7,8-tetrahydro-8-oxonaphthalene-1,2-dicarboxylate
    参考文献:
    名称:
    间苯二甲烯超分子有机催化剂在水性介质中功能化的1-四氢萘酮合成
    摘要:
    已经开发了一种有效的,直接的和环境友好的方法,该方法用于在水性介质中使用环状的1,3-二酮,丙二腈和二烷基乙酰二羧酸二甲酯作为起始原料来合成芴酮和1-四氢萘酮衍生物。在作为可重复使用的有机催化剂有效的间苯二酚[4]芳烃的存在下,该反应是有利的。该催化剂易于合成,并通过1 H,13 C NMR,IR,XRD和HRMS分析进行表征。间苯二酚[4]芳烃以较短的时间和良好的收率提供了所得产物。通过FT-IR和SEM图像确定催化剂的可回收性直至第6个循环。
    DOI:
    10.1016/j.tetlet.2018.09.037
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文献信息

  • The Synthesis and Photo-Induced Deprotection Reaction of Calix[4]resorcinarene Derivatives Containing<i>t</i>-Butyl Ester Moieties
    作者:Hiroto Kudo、Kouji Mitani、Tadatomi Nishikubo、Masaya Mitsuishi、Tokuji Miyashita
    DOI:10.1246/bcsj.77.819
    日期:2004.4
    The syntheses and photoinduced deprotection reactions of calix[4]resorcinarene derivatives with pendant t-butyl ester moieties were examined. Calix[4]resorcinarenes, 1a–1h, were prepared by the condensation reaction of resorcinol with certain aldehydes in the presence of hydrochloric acid as a catalyst in ethanol at 80 °C for 30 min in good yields. The substitution reaction of 1a–1h with t-butyl bromoacetate using cesium carbonate as a base and tetrabutylammmonium bromide (TBAB) as a phase transfer catalyst was performed to afford the corresponding calix[4]resorcinarene derivatives, 2a–2h with pendant t-butyl ester groups. It was found that 2a, 2e, 2f, 2g, and 2h had film forming properties. The photo-induced deprotection reaction of calixarene derivatives 2a, 2e, 2f, 2g, and 2h was examined in the presence of bis-[4-(diphenylsulfonio)phenyl] sulfide (DPSP) as a photoacid generator in the film state upon UV irradiation for 5 min followed by heating at 170 °C. It was found that the deprotection reaction of the t-butyl ester groups of 2a, 2e, 2f, 2g, and 2h proceeded smoothly to produce the corresponding calixarene derivatives, 3a, 3e, 3f, 3g, and 3h with carboxylic acid groups, quantitatively.
    本研究考察了具有悬垂 t-丁基酯分子的钙并[4]间苯二酚衍生物的合成和光诱导脱保护反应。在盐酸作为催化剂的存在下,间苯二酚与某些醛在乙醇中于 80 °C 下缩合反应 30 分钟,制备了 1a-1h 钙并[4]间苯二酚衍生物,收率良好。以碳酸铯为碱,四丁基溴化铵(TBAB)为相转移催化剂,将 1a-1h 与溴乙酸叔丁酯进行取代反应,得到了相应的钙[4]间苯二酚衍生物 2a-2h,并带有悬垂的叔丁酯基团。研究发现,2a、2e、2f、2g 和 2h 具有成膜特性。在双[4-(二苯基磺酰基)苯基]硫醚(DPSP)作为光酸发生器的存在下,紫外线照射 5 分钟,然后在 170 ℃ 下加热,考察了萼片烯衍生物 2a、2e、2f、2g 和 2h 在薄膜状态下的光诱导脱保护反应。研究发现,2a、2e、2f、2g 和 2h 的 t-丁酯基团的脱保护反应进展顺利,可定量生成相应的钙烯烃衍生物 3a、3e、3f、3g 和 3h,并带有羧酸基团。
  • CALIXARENE AND PHOTORESIST COMPOSITION COMPRISING SAME
    申请人:Rohm and Haas Electronic Materials LLC
    公开号:US20130078569A1
    公开(公告)日:2013-03-28
    A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R 1 ) 2 ═C(R 2 )—O-(L) n -Ar 1 , and a calix[4]arene, wherein R 1 and R 2 are each independently a single bond, H, C 1-20 alkyl, C 1-20 haloalkyl, C 6-20 aryl, C 6-20 haloaryl, C 7-20 aralkyl, or C 7-20 haloaralkyl, L is a C 1-20 linking group, n is 0 or 1, and Ar 1 is a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic C 6-20 aromatic-containing moiety, wherein R 1 and R 2 are connected to Ar 1 when either or both of R 1 and R 2 is a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.
    一种分子玻璃化合物包括芳香基乙烯醚的乙烯醚加合物,化学式为C(R1)2═C(R2)—O-(L)n-Ar1,以及一种杯芳烃[4],其中R1和R2分别独立为单键,H,C1-20烷基,C1-20卤代烷基,C6-20芳基,C6-20卤代芳基,C7-20芳基烷基,或C7-20卤代芳基烷基,L是C1-20连接基,n为0或1,Ar1是含卤素的单环芳基,或取代或未取代的多环或融合多环C6-20芳基结构,当R1和R2中的一个或两个为单键且n为0时,R1和R2与Ar1相连。此外,还公开了包括该分子玻璃化合物、溶剂和光酸发生剂的光阻剂,包括(a)具有一个或多个要在其表面上进行图案化的层的基板;和(b)覆盖在要进行图案化的一个或多个层上的光阻剂组合物层,以及形成该分子玻璃化合物的方法。
  • Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography
    作者:Seung Wook Chang、Ramakrishnan Ayothi、Daniel Bratton、Da Yang、Nelson Felix、Heidi B. Cao、Hai Deng、Christopher K. Ober
    DOI:10.1039/b514065j
    日期:——
    Extreme ultra violet (EUV) lithography is one of the most promising next generation lithographic techniques for the production of sub-50 nm feature sizes with applications in the semiconductor industry. Coupling this technique with molecular glass resists is an effective strategy for high resolution lithographic patterning. In this study, a series of tert-butyloxycarbonyl (t-Boc) protected C-4-hydroxyphenyl-calix[4]resorcinarenes derivatives were synthesized and evaluated as positive tone molecular glass resists for EUV lithography. The amorphous nature of these molecules was confirmed using thermal analysis, FTIR and powder X-ray diffraction. Feature sizes as small as 30 nm with low line edge roughness (4.5 nm, 3σ) were obtained after patterning and development.
    极紫外(EUV)光刻技术是最有前途的下一代光刻技术之一,可用于生产 50 纳米以下的特征尺寸,并可应用于半导体行业。将这一技术与分子玻璃抗蚀剂相结合,是实现高分辨率光刻图案化的有效策略。在本研究中,合成了一系列叔丁氧羰基(t-Boc)保护的 C-4-hydroxyphenyl-calix[4]resorcinarenes 衍生物,并将其作为正色调分子玻璃抗蚀剂进行了评估,以用于 EUV 光刻技术。热分析、傅立叶变换红外光谱和粉末 X 射线衍射证实了这些分子的无定形性质。在图案化和显影后,可获得小至 30 纳米的特征尺寸和较低的线边缘粗糙度(4.5 纳米,3σ)。
  • [EN] MACROCYCLIC POLYPHENOLS FOR UNIVERSAL COATINGS<br/>[FR] POLYPHÉNOLS MACROCYCLIQUES POUR REVÊTEMENTS UNIVERSELS
    申请人:UNIV CALIFORNIA
    公开号:WO2017147145A1
    公开(公告)日:2017-08-31
    The disclosure provides for coating compositions comprising macrocycles and salts in aqueous buffer and the use of the coating composition to prevent absorption of small molecules into polymeric surfaces.
    本公开提供了一种包含大环分子和盐的水性缓冲液涂层组合物,并且利用该涂层组合物来防止小分子被聚合物表面吸收的方法。
  • Synthesis of Novel Chemically Amplified Materials Based on Calix[4]arene Derivatives with Acetal Moieties
    作者:Hiroto Kudo、Kouji Mitani、Syuhei Koyama、Tadatomi Nishikubo
    DOI:10.1246/bcsj.77.2109
    日期:2004.11
    The synthesis and photoinduced deprotection reaction of calix[4]resorcinarene derivatives with pendant acetal moieties were examined. C-methyl[(methoxymethylcarbonyl)oxy]calix[4]resorcinarene (CRA-Acetal) and C-4-hydroxyphenyl[(methoxymethylcarbonyl)oxy]calix[4]resorcinarene (CRAph-Acetal) were prepared from C-methylcalix[4]resorcinarene (CRA) and C-4-hydroxyphenylcalix[4]resorcinarene (CRAph). The synthesized CRA-Acetal and CRAph-Acetal had good solubilities, good film-forming properties, and high thermal stabilities. The photoinduced deprotection reaction of CRA-Acetal and CRAph-Acetal was examined in the presence of bis[4-(diphenylsulfonio)phenyl]sulfide (DPSP) as a photo-acid generator in the film state upon UV irradiation. It was found that the deprotection reaction of acetal groups of CRA-Acetal and CRAph-Acetal proceeded smoothly without further heating to produce the corresponding calixarene derivatives, CRA-COOH and CRAph-COOH with carboxylic acid groups.
    研究了带有乙缩醛侧基的杯[4]萘并芘衍生物的合成和光诱导脱保护反应。通过C-甲基杯[4]萘并芘(CRA)和C-4-羟基苯基杯[4]萘并芘(CRAph)制备了C-甲基[(甲氧基甲基羰基)氧基]杯[4]萘并芘(CRA-乙缩醛)和C-4-羟基苯基[(甲氧基甲基羰基)氧基]杯[4]萘并芘(CRAph-乙缩醛)。合成的CRA-乙缩醛和CRAph-乙缩醛具有良好的溶解性、成膜性和热稳定性。在双[4-(二苯基硫鎓)苯基]硫醚(DPSP)作为光酸产生剂存在的情况下,研究了CRA-乙缩醛和CRAph-乙缩醛的光诱导脱保护反应。研究发现,CRA-乙缩醛和CRAph-乙缩醛的乙缩醛基团的脱保护反应顺利进行,无需进一步加热即可生成相应的带有羧酸基团的杯芳烃衍生物CRA-COOH和CRAph-COOH。
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