1-[fluoro-bis(trimethylsilyl)methyl]-3-methoxybenzene | 1355722-48-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 1-[fluoro-bis(trimethylsilyl)methyl]-3-methoxybenzene
• 英文别名: [Fluoro-(3-methoxyphenyl)-trimethylsilylmethyl]-trimethylsilane；[fluoro-(3-methoxyphenyl)-trimethylsilylmethyl]-trimethylsilane
• CAS: 1355722-48-3
• 化学式: C₁₄H₂₅FOSi₂
• 分子量: 284.521
• InChiKey: XUHHOSMKUUYAPS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.61
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  三甲基氯硅烷 、 3-(三氟甲基)苯甲醚 在 Cu-Mg 作用下， 以 地昔帕明 为溶剂， 反应 5.0h， 以91%的产率得到[difluoro(3-methoxyphenyl)methyl]trimethylsilane
  参考文献：
  名称：

  Cu-deposits on Mg metal surfaces promote electron transfer reactions

  摘要：

  The enhancement of the electron transfer processes in the Grignard reagent formation-type ring silylation and the defluorination-silylation of perfluoroalkyl benzenes by Cu(0)-deposited Mg metal were confirmed. Microscopic analysis and substituent effects implied a different reduction process in the presence of Cu-deposited Mg metal than in the presence of bare Mg metal. (C) 2011 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tet.2011.11.082

文献信息

• Cu-deposits on Mg metal surfaces promote electron transfer reactions
  作者：Shinya Utsumi、Toshimasa Katagiri、Kenji Uneyama

  DOI：10.1016/j.tet.2011.11.082

  日期：2012.1

  The enhancement of the electron transfer processes in the Grignard reagent formation-type ring silylation and the defluorination-silylation of perfluoroalkyl benzenes by Cu(0)-deposited Mg metal were confirmed. Microscopic analysis and substituent effects implied a different reduction process in the presence of Cu-deposited Mg metal than in the presence of bare Mg metal. (C) 2011 Elsevier Ltd. All rights reserved.