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N,N-diallyl-hexanamide | 31335-86-1

中文名称
——
中文别名
——
英文名称
N,N-diallyl-hexanamide
英文别名
N,N-diallylhexanamide;N,N-Bis(prop-2-en-1-yl)hexanamide;N,N-bis(prop-2-enyl)hexanamide
N,N-diallyl-hexanamide化学式
CAS
31335-86-1
化学式
C12H21NO
mdl
——
分子量
195.305
InChiKey
CMASVQJEKUZMQH-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    281.0±29.0 °C(Predicted)
  • 密度:
    0.883±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    2.9
  • 重原子数:
    14
  • 可旋转键数:
    8
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.58
  • 拓扑面积:
    20.3
  • 氢给体数:
    0
  • 氢受体数:
    1

反应信息

  • 作为反应物:
    描述:
    N,N-diallyl-hexanamide 在 [{Ru(η33-C10H16)(μ-Cl)Cl}2] potassium metaperiodate 作用下, 以 为溶剂, 反应 3.0h, 以97%的产率得到己酰胺
    参考文献:
    名称:
    N-烯丙基酰胺和内酰胺在水性介质中催化脱保护的高效串联过程:双(烯丙基)-钌(IV)催化剂[Ru(eta3:eta2:eta3-C12H18)Cl2]和[{Ru (eta3:eta3-C10H16)(micro-Cl)Cl} 2]。
    摘要:
    通过使用市售的双(烯丙基)-钌(IV)催化剂[Ru(eta(3):eta(2): eta(3)-C(12)H(18))Cl(2)](C(12)H(18)= dodeca-2,6,10-triene-1,12-diyl)和[{Ru( eta(3):eta(3)-C(10)H(16))(micro-Cl)Cl}(2)](C(10)H(16)= 2,7-二甲基辛基-2,6-二烯-1,8-二基)。串联过程发生在水性介质中并以一锅法进行,涉及烯丙基单元的C = C键的初始异构化和随后生成的烯酰胺的氧化裂解。
    DOI:
    10.1002/chem.200700477
  • 作为产物:
    描述:
    己酰氯二烯丙基胺甲苯 为溶剂, 反应 12.0h, 以91%的产率得到N,N-diallyl-hexanamide
    参考文献:
    名称:
    N-烯丙基酰胺和内酰胺在水性介质中催化脱保护的高效串联过程:双(烯丙基)-钌(IV)催化剂[Ru(eta3:eta2:eta3-C12H18)Cl2]和[{Ru (eta3:eta3-C10H16)(micro-Cl)Cl} 2]。
    摘要:
    通过使用市售的双(烯丙基)-钌(IV)催化剂[Ru(eta(3):eta(2): eta(3)-C(12)H(18))Cl(2)](C(12)H(18)= dodeca-2,6,10-triene-1,12-diyl)和[{Ru( eta(3):eta(3)-C(10)H(16))(micro-Cl)Cl}(2)](C(10)H(16)= 2,7-二甲基辛基-2,6-二烯-1,8-二基)。串联过程发生在水性介质中并以一锅法进行,涉及烯丙基单元的C = C键的初始异构化和随后生成的烯酰胺的氧化裂解。
    DOI:
    10.1002/chem.200700477
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文献信息

  • Photosensitive resin composition and uses thereof
    申请人:CHI MEI CORPORATION
    公开号:US09568763B2
    公开(公告)日:2017-02-14
    The invention relates to a photosensitive resin composition that has the advantages of high developability, good hardness, and good sputtered resistance. The invention also provides a method for manufacturing a color filter, color filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), an organic solvent (D), a pigment (E), and a compound (F).
    该发明涉及一种具有高显影性、良好硬度和良好溅射抗性的感光树脂组合物。该发明还提供了一种制造彩色滤光片、彩色滤光片和液晶显示装置的方法。该感光树脂组合物包括碱溶性树脂(A)、含有乙烯基不饱和基团的化合物(B)、光引发剂(C)、有机溶剂(D)、颜料(E)和化合物(F)。
  • Synthesis of Heterofunctionalised Diamines and Triamines by Hydroaminomethylation of Diallyl Ethers, -silanes, or -amines
    作者:Peter Eilbracht、Christian Ludger Kranemann、Lars Bärfacker
    DOI:10.1002/(sici)1099-0690(199908)1999:8<1907::aid-ejoc1907>3.0.co;2-s
    日期:1999.8
    Starting from diallyl ethers, -silanes, or -amines various di- or triamines with potential biological activity are obtainable in one step by RhI-catalysed hydroaminomethylation of the alkene moieties in the presence of synthesis gas.
    从二烯丙基醚,-silanes开始,或-胺各种二-或具有潜在生物活性三胺在一个步骤中获得的由我在合成气体的存在-催化的烯烃部分的hydroaminomethylation。
  • METHODS OF TREATING TEXTILE FIBRES
    申请人:Allen Warrick James David
    公开号:US20140315022A1
    公开(公告)日:2014-10-23
    According to the invention there is provided a method of treating textile fibres including the steps of: providing a polymeric precursor which includes a group of sub-formula (I) where R 2 and R 3 are independently selected from (CR 7 R 8 ) n , or a group CR 9 R 10 , CR 7 R 8 CR 9 R 10 or CR 9 R 10 CR 7 R 8 where n is 0, 1 or 2, R 7 and R 8 are independently selected from hydrogen, halo or hydrocarbyl, and either one of R 9 or R 10 is hydrogen and the other is an electron withdrawing group, or R 9 and R 10 together form an electron withdrawing group, and R 4 and R 5 are independently selected from CH or CR 11 where R 11 is an electron withdrawing group, the dotted lines indicate the presence or absence of a bond, X 1 is a group CX 2 X 3 where the dotted line bond to which it is attached is absent and a group CX 2 where the dotted line bond to which it is attached is present, Y 1 is a group CY 2 Y 3 where the dotted line bond to which it is attached is absent and a group CY 2 where the dotted line bond to which it is attached is present, and X 2 , X 3 , Y 2 and Y 3 are independently selected from hydrogen, fluorine or other substituents, R 1 is selected from hydrogen, halo, nitro, hydrocarbyl, optionally substituted or interposed with functional groups, or —R 3 -R 5 ≡Y 1 , and R 13 is C(O) or S(0) 2 ; coating the textile fibres with the polymeric precursor; and polymerising the polymeric precursor so as to produce a polymeric coating on the textile fibres.
    根据本发明,提供了一种处理纺织纤维的方法,包括以下步骤:提供一种聚合物前体,其中包括一个亚式(I)的基团,其中R2和R3独立地选择自(CR7R8)n,或者选择自CR9R10、CR7R8CR9R10或CR9R10CR7R8的基团,其中n为0、1或2,R7和R8独立地选择自氢、卤素或烃基,而R9和R10中的任意一个是氢,另一个是电子提取基团,或者R9和R10一起形成电子提取基团,而R4和R5独立地选择自CH或CR11,其中R11是电子提取基团,点线表示键的存在或不存在,X1是一个CX2X3基团,其中它附着的点线键不存在,以及一个CX2基团,其中它附着的点线键存在,Y1是一个CY2Y3基团,其中它附着的点线键不存在,以及一个CY2基团,其中它附着的点线键存在,而X2、X3、Y2和Y3独立地选择自氢、或其他取代基,R1选择自氢、卤素、硝基、烃基、可选地带有功能基团或者-R3-R5≡Y1,而R13是C(O)或S(0)2;用聚合物前体涂覆纺织纤维;并聚合聚合物前体,使其在纺织纤维上形成聚合物涂层。
  • PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF
    申请人:CHI MEI CORPORATION
    公开号:US20150041735A1
    公开(公告)日:2015-02-12
    The invention relates to a photosensitive resin composition that has the advantages of high developability, good hardness, and good sputtered resistance. The invention also provides a method for manufacturing a color filter, color filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), an organic solvent (D), a pigment (E), and a compound (F).
    该发明涉及一种具有高显影性、良好硬度和良好溅射抗性的光敏树脂组合物。该发明还提供了一种制造彩色滤光片、彩色滤光片和液晶显示装置的方法。该光敏树脂组合物包括碱溶性树脂(A)、含有乙烯基不饱和基团的化合物(B)、光引发剂(C)、有机溶剂(D)、颜料(E)和化合物(F)。
  • METHODS OF COATING A LOW SURFACE ENERGY SUBSTRATE
    申请人:Allen Warrick James David
    公开号:US20140370279A1
    公开(公告)日:2014-12-18
    According to the invention there is provided a method of coating a low surface energy substrate including the steps of: a) providing a polymeric precursor which includes a group of sub-formula (I) where R 1 is i) CR a , where R a is hydrogen or alkyl, ii) a group S(0) p R 13 , or SiR 14 where R 13 and R 14 are independently selected from hydrogen or hydrocarbyl, p is 0, 1 or 2 and q is 1 or 2, iii) C(0)N, S(0) 2 N, C(0)ON, CH 2 ON, or CH═CHR C N where R c is an electron withdrawing group, or iv) OC(0)CH, C(0)OCH or S(0)2CH; in which R 12 is selected from hydrogen, halo, nitro, hydrocarbyl, optionally substituted or interposed with functional groups, or formula (II) R 2 and R 3 are independently selected from (CR 7 R 8 )n, or a group CR 9 R 10 , CR 7 R 8 CR 9 R 10 or CR 9 R 10 CR 7 R 8 where n is 0, 1 or 2, R 7 and R 8 are independently selected from hydrogen or alkyl, and either one of R 9 or R 10 is hydrogen and the other is an electron withdrawing group, or R 9 and R 10 together form an electron withdrawing group; R 4 and R 5 are independently selected from CH or CR 11 where CR 11 is an electron withdrawing group, the dotted lines indicate the presence or absence of a bond, X 1 is a group CX 2 X 3 where the dotted line bond to which it is attached is absent and a group CX 2 where the dotted line to which it is attached is present, Y 1 is a group CY 2 Y 3 where the dotted line to which it is attached is absent and a group CY 2 where the dotted line to which it is attached is present, and X 2, X 3 , Y 2 and Y 3 are independently selected from hydrogen, fluorine or other substituents; and b) either (i) coating the low surface energy substrate with the polymeric precursor and polymerising the polymeric precursor to form a polymeric coating, or (ii) polymerising the polymeric precursor and contacting the polymerised polymeric precursor with a low surface energy substrate to form a polymeric coating on the low surface energy substrate.
    根据本发明提供了一种涂覆低表面能基材料的方法,包括以下步骤:a)提供一个聚合物前体,其中包括一个亚公式(I)的基团,其中R1是i)CRa,其中Ra是氢或烷基,ii)一个S(0)pR13基团,或SiR14,其中R13和R14独立选择自氢或烃基,p为0、1或2,q为1或2,iii)C(0)N,S(0)2N,C(0)ON,CH2ON或CH═CHRCN,其中Rc是一个电子提取基团,或iv)OC(0)CH,C(0)OCH或S(0)2CH;其中R12选择自氢、卤素、硝基、烃基(可选择性地取代或插入功能基团)或公式(II)R2和R3独立选择自(CR7R8)n,或一个CR9R10基团,CR7R8CR9R10或CR9R10CR7R8基团,其中n为0、1或2,R7和R8独立选择自氢或烷基,R9或R10之一为氢,另一个为电子提取基团,或R9和R10一起形成电子提取基团;R4和R5独立选择自CH或CR11,其中CR11是电子提取基团,虚线表示有或无化学键,X1是一个CX2X3基团,其中它所附着的虚线键不存在,以及一个CX2基团,其中它所附着的虚线存在,Y1是一个CY2Y3基团,其中它所附着的虚线键不存在,以及一个CY2基团,其中它所附着的虚线存在,X2、X3、Y2和Y3独立选择自氢、或其他取代基团;和b)或者(i)用聚合物前体涂覆低表面能基材料并聚合聚合物前体形成聚合物涂层,或者(ii)聚合聚合物前体并将聚合后的聚合物前体与低表面能基材料接触以形成低表面能基材料上的聚合物涂层。
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