A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.
一种图案形成方法包括在基底的表面层上涂敷第一种组合物以形成第一层涂膜。表面层包括包含
金属原子的第一区域和包含
硅原子的第二区域。加热第一层涂膜。除在加热的第一涂膜的第一区域上形成的部分以外的部分或除在第二区域上形成的部分以外的部分被去除,从而形成第一层压部分。在形成第一层压部分的基底上涂覆第二种组合物,形成第二涂膜。第二层涂膜被加热或曝光。除在加热或暴露的第二涂膜的第一层压部分上形成的部分之外的部分被去除,从而形成第二层压部分。