diphenyl[4-(phenylthio)phenyl]-sulfonium nonaflate | 338445-29-7

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: diphenyl[4-(phenylthio)phenyl]-sulfonium nonaflate
• 英文别名: (4-phenylsulfanylphenyl)diphenylsulfonium nonafluorobutanesulfonate；diphenyl[4-(phenylsulfanyl)phenyl]sulfanium perfluorobutanesulfonate；(4-phenylthiophenyl).diphenylsulfonium nonafluoro-n-butanesulfonate；diphenyl-4-phenylthiophenylsulfonium nonafluorobutanesulfonate；diphenyl-(4-phenylsulfanylphenyl)sulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• CAS: 338445-29-7
• 化学式: C₄F₉O₃S*C₂₄H₁₉S₂
• 分子量: 670.641
• InChiKey: FEELUMNBAODGBA-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  8.89
• 重原子数：
  43
• 可旋转键数：
  7
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  91.9
• 氢给体数：
  0
• 氢受体数：
  13

反应信息

• 作为反应物：
  描述：

  diphenyl[4-(phenylthio)phenyl]-sulfonium nonaflate 、 全氟-1-丁磺酸 在 potassium iodate 、 硫酸 、 乙酸酐 作用下， 以 二氯甲烷 、 水 为溶剂， 反应 12.0h， 以44%的产率得到bis{4-[4-(diphenylsulfonio)-phenylthio]-phenyl} iodonium tris(nonafluorobutanesulfonate)
  参考文献：
  名称：

  HYBRID ONIUM SALT

  摘要：

  公开号：

  EP1443042B1
• 作为产物：
  描述：

  二苯硫醚 在 氢溴酸 、 焦磷酸 作用下， 以 二氯甲烷 、 水 为溶剂， 反应 5.33h， 生成 diphenyl[4-(phenylthio)phenyl]-sulfonium nonaflate
  参考文献：
  名称：

  METHOD OF MANUFACTURING SULTONIUM SALT

  摘要：

  提供一种亚砜盐的制备方法，可以减少单亚砜盐的产生。制备亚砜盐的方法包括：准备含有亚砜阳离子和第一阴离子的第一亚砜盐，通过将第一阴离子与卤离子交换来制备第二亚砜盐，通过将卤离子与第二阴离子交换来制备第三亚砜盐。

  公开号：

  US20160068477A1

文献信息

• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Hybrid onium salt
  申请人：Ishihara Masami

  公开号：US20050020710A1

  公开（公告）日：2005-01-27

  The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provides a hybrid type onium salt shown by the general formula [1]: [wherein R 1 to R 3 are each independently a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group or an amino group which maybe substituted; Q 1 is a direct-linkage, an oxygen atom, a sulfur atom or a lower alkylene chain; T 1 is an alkylene group or an arylene group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted; and R 4 is an alkyl group, an alkenyl group, an aryl group or an aralkyl group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted or a group shown by the general formula [2]: (wherein R 5 to R 7 are each independently a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group or an amino group which maybe substituted; Q 2 is a direct-linkage, an oxygen atom, a sulfur atom or a lower alkylene chain; T 2 an alkylene group or an arylene group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted; A 3 is a counter anion; m is an integer of 0 to 4; and two ns are each independently an integer of 0 to 5); A 1 and A 2 are each independently a counter anion; and m and n are the same as described above], and a polymerization initiator or an acid generator, comprising said onium salt.

  本发明涉及一种杂化型离子盐，其分子中具有碘化离子盐和亚砜盐，例如，作为阳离子型光聚合引发剂和化学放大型抗蚀剂的酸发生剂有用，并提供由通式[1]所示的杂化型离子盐：[其中R1至R3分别独立地是卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基或氨基，可被取代；Q1是直链、氧原子、硫原子或较低的烷基链；T1是烷基或芳基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基；R4是烷基、烯丙基、芳基或芳基烷基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基或由通式[2]所示的基：（其中R5至R7分别独立地是卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基或氨基，可被取代；Q2是直链、氧原子、硫原子或较低的烷基链；T2是烷基或芳基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基；A3是一个对离子；m是0到4的整数；两个n各自独立地是0到5的整数）；A1和A2各自独立地是一个对离子；m和n与上述描述相同]，以及包含该离子盐的聚合引发剂或酸发生剂。
• Hybrid type onium salt
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：US07101918B2

  公开（公告）日：2006-09-05

  The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, Useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provides a hybrid type onium salt shown by the general formula [1]: and R4 is an alkyl group, an alkenyl group, an aryl group or an aralkyl group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted or a group shown by the general formula [2]: and a polymerization initiator or an acid generator, comprising said onium salt.

  本发明涉及一种混合型离子盐，其分子中含有碘离子盐和磺离子盐，例如可用作阳离子型光聚合引发剂和化学增感抗蚀剂的酸发生剂，并提供了一种由通式[1]所示的混合型离子盐，其中R4是一种烷基、烯基、芳基或芳烷基，可以具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和氨基中选择的取代基或由通式[2]所示的基团。本发明还涉及包含该离子盐的聚合引发剂或酸发生剂。
• RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE
  申请人：Clariant International Ltd.

  公开号：EP1033624A1

  公开（公告）日：2000-09-06

  A chemically amplified radiation sensitive composition is provided which comprises a film forming hydroxystyrene based resin in combination with an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator. This composition can realize neither corrosion of apparatuses by outgas, nor T-shaped pattern profiles, nor change in linewidth attributable to process time delay, on the other side, high sensitivity and resolution, and good pattern profiles and stability thereof.

  本发明提供了一种化学放大辐射敏感组合物，该组合物由成膜的羟基苯乙烯基树脂与鎓盐前体结合而成，鎓盐前体生成氟化烷磺酸作为光酸发生器。这种组合物既不会因放出气体而腐蚀设备，也不会产生 T 型图案轮廓，也不会因加工时间延迟而改变线宽，同时还具有高灵敏度和高分辨率，以及良好的图案轮廓和稳定性。
• Radiation-sensitive resin composition
  申请人：JSR Corporation

  公开号：EP1253470A2

  公开（公告）日：2002-10-30

  A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), (R1, R2, and R3 is hydrogen, hydroxyl group, or monovalent organic group and R4 is monovalent acid-dissociable group), (B) an alkali insoluble or scarcely soluble resin comprising a recurring unit of the following formula (2), (R5 is hydrogen or monovalent organic group, R' hydrogen or methyl, n 1-3, m 0-3) and a recurring unit containing acid-dissociable group, and (C) a photoacid generator. The resin composition is useful as a chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure.

  一种辐射敏感树脂组合物，包括(A)下式(1)的化合物、 (R1、R2 和 R3 为氢、羟基或一价有机基团，R4 为一价酸解离基团），（B）碱不溶性或难溶性树脂，包括下式（2）的循环单元、 (R5 为氢或一价有机基团，R' 为氢或甲基，n 1-3，m 0-3)和含有酸可分解基团的循环单元，以及 (C) 光酸发生器。该树脂组合物可用作化学放大抗蚀剂，具有高灵敏度、高分辨率、高辐射透过率和表面平滑度，并且不会在过度曝光时出现部分不溶解的问题。