2-propenoic acid 2-methylcyclohexyl ester | 54907-42-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-propenoic acid 2-methylcyclohexyl ester
• 英文别名: acrylic acid-(2-methyl-cyclohexyl ester)；(2-Methyl-cyclohexyl)-acrylat；Acrylsaeure-(2-methyl-cyclohexylester)；Opt.-inakt. 2-Acryloyloxy-1-methyl-cyclohexan；2-Methylcyclohexyl prop-2-enoate；(2-methylcyclohexyl) prop-2-enoate
• CAS: 54907-42-5
• 化学式: C₁₀H₁₆O₂
• 分子量: 168.236
• InChiKey: SSLASPHAKUVIRG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  12
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-甲基环己醇 、 丙烯酸甲酯（MA） 在 diamylhydroquinone 、 硫酸 作用下， 生成 2-propenoic acid 2-methylcyclohexyl ester
  参考文献：
  名称：

  Preparation and Polymerization of Cycloalkyl Acrylates^1,2

  摘要：

  DOI：

  10.1021/ja01165a538

文献信息

• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER
  申请人：SAMSUNG SDI CO., LTD.

  公开号：US20200142301A1

  公开（公告）日：2020-05-07

  A photosensitive resin composition, a photosensitive resin layer, and a color filter, the composition including a colorant including a first green dye having a core-shell structure and a second green dye in a weight ratio of about 1:9 to about 7:3; a binder resin; a photopolymerizable compound; a photopolymerization initiator; and a solvent.

  一种感光树脂组合物、感光树脂层和彩色滤光片，该组合物包括一种颜料，其中包括具有核壳结构的第一绿色染料和第二绿色染料，其重量比约为1:9到7:3；一种粘合树脂；一种光聚合化合物；一种光聚合引发剂；和一种溶剂。
• RESIN COMPOSITION AND SEMICONDUCTOR DEVICE BOARD
  申请人：Osaku Yumi

  公开号：US20140087136A1

  公开（公告）日：2014-03-27

  A resin composition which contains a binder resin (A), radiation-sensitive compound (B), silane-modified resin (C), and antioxidant (D), wherein a content of the silane-modified resin (C) is 0.1 to 150 parts by weight with respect to 100 parts by weight of the binder resin (A), a content of the antioxidant (D) is 0.1 to 10 parts by weight with respect to 100 parts by weight of the binder resin (A), and an amount of warping is 14 μm or less when using the resin composition to form a thickness 2 to 3 μm resin film and baking the formed resin film at 230° C. is provided.

  一种树脂组合物，包含粘合剂树脂（A），辐射敏感化合物（B），硅改性树脂（C）和抗氧化剂（D），其中硅改性树脂（C）的含量相对于100份粘合剂树脂（A）为0.1至150份重量，抗氧化剂（D）的含量相对于100份粘合剂树脂（A）为0.1至10份重量，并且使用该树脂组合物形成2至3μm厚度的树脂膜并在230°C下烘烤形成的树脂膜翘曲量为14μm或以下。
• Radiation-sensitive resin composition
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0520626A1

  公开（公告）日：1992-12-30

  A radiation-sensitive resin composition comprising: (a) an epoxy group-containing alkali-soluble resin, or a combination of an alkali-soluble resin which may have an epoxy group and an epoxy compound, (b) 1,2-naphthoquinonediazide sulfonic acid ester, and (c) a solvent. The above radiation-sensitive resin composition is useful as a material for forming a lens.

  辐射敏感树脂组合物，包括 (a) 含环氧基团的碱溶性树脂，或含环氧基团的碱溶性树脂与环氧化合物的组合、 (b) 1,2-萘醌二叠氮磺酸酯，以及 (c) 溶剂。 上述辐射敏感树脂组合物可用作形成镜片的材料。
• Epoxy group-containing resin compositions
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0897938A2

  公开（公告）日：1999-02-24

  An epoxy group-containing thermosetting resin composition comprising (A) a copolymer obtained from (a) at least one member selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, (b) an epoxy group-containing unsaturated compound, (c) a monoolefin unsaturated compound, and (d) a conjugated diolefin unsaturated compound, and (B) an organic solvent for dissolving the above copolymer. There is also provided epoxy-group containing radiation sensitive resin composition which contains a component (A) obtained from (a), (b) and (c) and optionally (d), (C) a polymerizable compound having at least one ethylenically unsaturated double bond, and (D) a photopolymerization initiator. These epoxy-group containing thermosetting resin compositions are excellent in storage stability.

  一种含环氧基团的热固性树脂组合物，包括(A)由(a)至少一种选自不饱和羧酸和不饱和羧酸酐的共聚物，(b)含环氧基团的不饱和化合物，(c)单烯烃不饱和化合物和(d)共轭二烯烃不饱和化合物，以及(B)用于溶解上述共聚物的有机溶剂。此外，还提供了含有环氧基团的辐射敏感树脂组合物，该组合物含有由(a)、(b)和(c)以及可选的(d)得到的组分(A)，(C)具有至少一个乙烯不饱和双键的可聚合化合物，以及(D)光聚合引发剂。这些含有环氧基团的热固性树脂组合物具有优异的储存稳定性。
• Radiation sensitive resin composition and use of the same in an interlaminar insulating film
  申请人：JSR Corporation

  公开号：EP1057859A2

  公开（公告）日：2000-12-06

  A radiation sensitive resin composition which can be processed and molded at low temperatures and has resolution, solvent resistance, adhesion to a substrate and storage stability required as an interlaminar insulating film. This radiation sensitive resin composition comprises: (A) a copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy compound such as β-methylglycidyl acrylate and/or an epoxy compound such as a monomer represented by the following formula (3): and (a3) an olefinic unsaturated compound other than the above (a1) and (a2); and (B) a 1,2-quinonediazide compound.

  一种辐射敏感树脂组合物，可在低温下加工和成型，并具有作为层间绝缘薄膜所需的分辨率、耐溶剂性、与基材的粘附性和储存稳定性。 这种辐射敏感树脂组合物包括 (A) 由以下单体共聚而得的共聚物：(a1) 不饱和羧酸和/或不饱和羧酸酐；(a2) 环氧化合物，如丙烯酸 β-甲基缩水甘油酯和/或环氧化合物，如下式（3）所代表的单体： 和(a3) 除上述(a1)和(a2)之外的烯烃不饱和化合物；和 (B) 1,2-醌噻嗪化合物。