2-trifluoromethyl acrylic acid ethyl ester | 87769-68-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-trifluoromethyl acrylic acid ethyl ester
• 英文别名: Ethyl 2-(trifluoromethyl)prop-2-enoate
• CAS: 87769-68-4
• 化学式: C₆H₇F₃O₂
• 分子量: 168.116
• InChiKey: WFGNYCOGRUOTEB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  2-trifluoromethyl acrylic acid ethyl ester 在 溶剂黄146 、 calcium oxide 、 锌 作用下， 以 四氢呋喃 、 二氯甲烷 为溶剂， 反应 40.0h， 生成 ethyl 2-{[(ethoxycarbonyl)amino]methyl}-3,3,3-trifluoropropanoate
  参考文献：
  名称：

  Aza-Michael Addition of Nosyloxycarbamates to 2-(Trifluoromethyl)acrylates

  摘要：

  [GRAPHICS]The amination of 2-(trifluoromethyl)acrylates, performed by nosyloxycarbamates, gives two different aminated products, the derivatives of alpha-trifluoromethyl beta-amino esters or the aziridines, in high yields by changing the reaction conditions. The aza-Michael addition product was isolated for the first time in this kind of reaction. This finding confirms the aza-MIRC mechanism we previously proposed. Asymmetric induction was also pursued.

  DOI：

  10.1021/ol0361554
• 作为产物：
  描述：

  乙醇 、 2-(trifluoromethyl)acrylic chloride 生成 2-trifluoromethyl acrylic acid ethyl ester
  参考文献：
  名称：

  Substituted arylpyrazoles

  摘要：

  这项发明涉及一系列1-芳基-4-环丙基吡唑化合物，其中至少有一个氟原子连接到环丙基环上，以及包含这种化合物的组合物、它们的合成过程以及它们作为驱虫剂的用途。

  公开号：

  US20050148649A1

文献信息

• Hepatitis C Virus Inhibitors
  申请人：Hiebert Sheldon

  公开号：US20130115190A1

  公开（公告）日：2013-05-09

  Hepatitis C virus inhibitors having the general formula (I) are disclosed. Compositions comprising the compounds and methods for using the compounds to inhibit HCV are also disclosed.

  丙型肝炎病毒抑制剂具有通式（I）如下。还公开了包含这些化合物的组合物以及使用这些化合物抑制HCV的方法。
• HEPATITIS C VIRUS INHIBITORS
  申请人：BRISTOL-MYERS SQUIBB COMPANY

  公开号：US20150376233A1

  公开（公告）日：2015-12-31

  Hepatitis C virus inhibitors having the general formula (I) are disclosed. Compositions comprising the compounds and methods for using the compounds to inhibit HCV are also disclosed.

  揭示了具有一般式（I）的丙型肝炎病毒抑制剂。还公开了包含这些化合物的组合物和使用这些化合物抑制HCV的方法。
• BICYCLOHEXANE DERIVATIVE AND PRODUCTION METHOD FOR SAME
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2524907A1

  公开（公告）日：2012-11-21

  A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m' represents an integer of 0 to 10.)

  提供了一种在光刻胶领域、药物和杀虫剂的中间体领域等领域中有用的一种萜环己烷衍生物化合物，以及其制备方法。提供了由下述通用公式（II）表示的一种萜环己烷衍生物化合物。（在公式（II）中，Y独立表示1至10个碳原子的烷基、卤素原子、酰氧基、烷氧羰基或羟基，X1表示卤素原子，m表示0至11的整数，m'表示0至10的整数。）
• RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER
  申请人：Momose Hikaru

  公开号：US20090198065A1

  公开（公告）日：2009-08-06

  To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and R 1 represents H or a methyl group.

  提供一种抗蚀聚合物，其由一个具有结构式（1）或（2）所表示的酸分解单元作为结构单元，能够在DUV准分子激光微影或类似工艺中表现出小的线边粗糙度并产生少量缺陷。在式（1）和（2）中，n表示2至24的整数；J表示单键或二价碳氢基团，当n=2时可以具有取代基/杂原子，或者当n≥3时可以表示n价碳氢基团，可以具有取代基/杂原子；E表示聚合终止剂、链转移剂或聚合引发剂的残基；K1和K2分别表示至少选择自烷基、环烷基、氧烷基、芳烃、二价噻唑环、二价噁唑环和二价咪唑环中的至少一种；L1和L2分别表示至少选择自—C（O）O—、—C（O）—和—OC（O）—中的至少一种；M1、M2和M3分别表示至少选择自烷基、环烷基、氧烷基和芳烃中的至少一种；Y、Y1和Y2分别表示酸分解键；k1、k2、l1、L2、m1、m2和m3分别表示0或1；R1表示H或甲基基团。
• Adamantane derivatives and resin compositions using the same as raw material
  申请人：Furukawa Kikuo

  公开号：US20050158662A1

  公开（公告）日：2005-07-21

  The adamantane derivatives of the present invention which are represented by the general formula (1): wherein X is a hydrogen atom, alkyl, halogen-containing alkyl, halogen, or hydroxyl-, halogen-, nitrile- or ether-containing hydrocarbyl, and a plurality of X groups, if any, may be the same or different from each other; n 1 is an integer of 1 to 14; R 1 to R 4 may be the same or different from each other and are independently alkyl or halogen-containing alkyl; and Y 1 and Y 2 may be the same or different from each other and are independently a hydrogen atom or a group represented by the general formula (2): wherein R 5 to R 7 may be the same or different from each other and are independently a hydrogen atom, alkyl, halogen or halogen-containing alkyl, are excellent in optical properties, heat resistance and acid-dissociating property, and useful as crosslinking-type resins, optical materials such as optical fibers, light wave guides, optical disk substrates and photoresists as well as raw materials thereof, intermediate products of medicines or agricultural chemicals, and various other industrial products.

  本发明的金刚烷衍生物由一般式（1）表示：其中X为氢原子，烷基，含卤素的烷基，卤素，或含有羟基，卤素，腈基或醚基的烃基，如果有多个X基团，则它们可以相同或不同；n1为1到14的整数；R1到R4可以相同或不同，且独立地为烷基或含卤素的烷基；Y1和Y2可以相同或不同，且独立地为氢原子或由一般式（2）表示的基团：其中R5到R7可以相同或不同，且独立地为氢原子，烷基，卤素或含卤素的烷基。这些金刚烷衍生物在光学性能，耐热性和酸解离性方面表现优异，并且可用作交联型树脂，光学材料，例如光纤，光波导，光盘基板和光刻胶以及其原材料，药物或农药的中间体和各种其他工业产品。