申请人:Nissan Chemical Industries, Ltd.
公开号:EP1757985A1
公开(公告)日:2007-02-28
There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass%. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as F2 excimer laser beam (wavelength 157 nm) or ArF excimer laser beam (wavelength 193 nm), etc.
本发明提供了一种抗反射涂层形成组合物,该组合物由固体成分和溶剂组成,其中固体成分中硫原子的比例为 5 至 25 质量%。由该组合物制得的防反射涂层对反射光有很好的防止效果,不会与光刻胶混合,并且可以在光刻工艺中使用短波长的光,如 F2 准分子激光束(波长 157 nm)或 ArF 准分子激光束(波长 193 nm)等。