5-羟基-4-(2-羟基苯甲酰基)苯-1,3-二羧酸 | 820243-51-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 5-羟基-4-(2-羟基苯甲酰基)苯-1,3-二羧酸
• 英文名称: 5-hydroxy-4-(2-hydroxybenzoyl)isophthalic acid
• 英文别名: 1,3-Benzenedicarboxylic acid, 5-hydroxy-4-(2-hydroxybenzoyl)-；5-hydroxy-4-(2-hydroxybenzoyl)benzene-1,3-dicarboxylic acid
• CAS: 820243-51-4
• 化学式: C₁₅H₁₀O₇
• 分子量: 302.24
• InChiKey: DDQWYQYUNOWSNJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  22
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  132
• 氢给体数：
  4
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  5-羟基-4-(2-羟基苯甲酰基)苯-1,3-二羧酸 在 三氯化铝 、 sodium chloride 作用下， 反应 2.0h， 以50%的产率得到大黄酸
  参考文献：
  名称：

  Expedient Total Syntheses of Rhein and Diacerhein via Fries Rearrangement

  摘要：

  Short and practical total syntheses of rhein (1) and diacerhein (2) have been achieved via a Fries rearrangement and bis-carbonylation strategy followed by cyclization in molten salt, starting from dibromoester 7.

  DOI：

  10.1021/jo049228l
• 作为产物：
  描述：

  5-苄氧基-4-(2-苄氧基苯甲酰基)间苯二甲酸二甲酯 在 palladium on activated charcoal 氢氧化钾 、 氢气 作用下， 以 甲醇 、 乙醇 为溶剂， 20.0~60.0 ℃ 、100.0 kPa 条件下， 反应 60.0h， 生成 5-羟基-4-(2-羟基苯甲酰基)苯-1,3-二羧酸
  参考文献：
  名称：

  Expedient Total Syntheses of Rhein and Diacerhein via Fries Rearrangement

  摘要：

  Short and practical total syntheses of rhein (1) and diacerhein (2) have been achieved via a Fries rearrangement and bis-carbonylation strategy followed by cyclization in molten salt, starting from dibromoester 7.

  DOI：

  10.1021/jo049228l

文献信息

• Protective film forming agent and method for producing semiconductor chip
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11407063B2

  公开（公告）日：2022-08-09

  A protective film forming agent for dicing of semiconductor wafers for forming a protective film on the surface of the semiconductor wafers and capable of forming a protective film of high absorbance index, and a production method of semiconductor chips using the protective film forming agent. In a protective film forming agent containing a water-soluble resin, light absorber and solvent, a compound having a specific structure is used as the light absorber. The content of the light absorber in the protective film forming agent is 0.1% by mass or more and 10% by mass or less.

  一种用于半导体晶片切割的保护膜形成剂，可在半导体晶片表面形成保护膜，并能形成高吸收指数的保护膜，以及一种使用该保护膜形成剂的半导体芯片生产方法。在含有水溶性树脂、光吸收剂和溶剂的保护膜形成剂中，使用了具有特定结构的化合物作为光吸收剂。光吸收剂在保护膜成型剂中的含量为 0.1%（以质量计）以上，10%（以质量计）以下。
• PROTECTIVE FILM FORMING AGENT AND METHOD FOR PRODUCING SEMICONDUCTOR CHIP
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20210031300A1

  公开（公告）日：2021-02-04

  A protective film forming agent for dicing of semiconductor wafers for forming a protective film on the surface of the semiconductor wafers and capable of forming a protective film of high absorbance index, and a production method of semiconductor chips using the protective film forming agent. In a protective film forming agent containing a water-soluble resin, light absorber and solvent, a compound having a specific structure is used as the light absorber. The content of the light absorber in the protective film forming agent is 0.1% by mass or more and 10% by mass or less.
• Expedient Total Syntheses of Rhein and Diacerhein via Fries Rearrangement
  作者：Steve Tisserand、Rachid Baati、Marc Nicolas、Charles Mioskowski

  DOI：10.1021/jo049228l

  日期：2004.12.1

  Short and practical total syntheses of rhein (1) and diacerhein (2) have been achieved via a Fries rearrangement and bis-carbonylation strategy followed by cyclization in molten salt, starting from dibromoester 7.