5-降冰片烯-1'-甲基环戊基羧酸酯 | 369648-89-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 5-降冰片烯-1'-甲基环戊基羧酸酯
• 中文别名: 5-降冰片烯-2-羧酸(1'-甲基环戊基)酯
• 英文名称: 1-Methylcyclopentyl bicyclo[2.2.1]hept-5-ene-2-carboxylate
• 英文别名: (1-methylcyclopentyl) bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 369648-89-5
• 化学式: C₁₄H₂₀O₂
• 分子量: 220.31
• InChiKey: KRJJDXSTPKETCM-UHFFFAOYSA-N

物化性质

• 沸点：
  289.9±19.0 °C(Predicted)
• 密度：
  1.08±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

安全信息

• 海关编码：
  2916209090

文献信息

• GENERATION OF ENDO- AND/OR EXO-NORBORNENECARBOXALDEHYDE AS AN INTERMEDIATE TO FUNCTIONALIZED NORBORNENES
  申请人：Bell Andrew

  公开号：US20090118539A1

  公开（公告）日：2009-05-07

  Embodiments in accordance with the present invention provide for forming essentially pure diastereomers of 5/6-substituted norbornene-type monomers. Further, embodiments in accordance with the present invention encompass polymerizing such diastereomers to form addition or ROMP polymers where a desired exo-/endo-ratio of the diastereomers is provided to the polymerization, such ratio designed to provide a desired ratio of endo-/exo-structured repeating units for a resulting polymer to have desired physical or chemical properties.

  根据本发明的实施例，提供形成基本纯的5/6-取代去氢莰烯型单体的异构体。此外，根据本发明的实施例涵盖聚合这种异构体以形成加成或ROMP聚合物，其中所提供给聚合反应的异构体的期望外/内比例设计为提供所得聚合物具有期望的物理或化学性质的外/内结构重复单元的期望比例。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20020009668A1

  公开（公告）日：2002-01-24

  A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), 1 wherein R 1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X 1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R 2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

  公开了一种辐射敏感的树脂组合物，包括一个含有酸敏感基团的树脂和一个光酸发生剂。该树脂的结构式为(1)，其中R1代表氢原子、一价酸敏感基团、不含酸敏感基团的1-6个碳原子的烷基或不含酸敏感基团的2-7个碳原子的烷基酰基，X1代表线性或支链的含有1-4个碳原子的氟化烷基，R2代表氢原子、含有1-10个碳原子的线性或支链烷基，或含有1-10个碳原子的线性或支链氟化烷基。该树脂组合物表现出辐射的高透过率、高敏感度、分辨率和图案形状，可用于在高产率下生产半导体中的化学放大图案。
• Vinyl Addition Polycyclic Olefin Polymers Prepared With Non-Olefinic Chain Transfer Agents And Uses Thereof
  申请人：Rhodes Larry F.

  公开号：US20100177488A1

  公开（公告）日：2010-07-15

  A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to faun a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H 2 , alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

  一种聚合多（环）烯烃单体的方法，包括（a）将含有多（环）烯烃单体、非烯烃链转移剂和活化剂化合物的单体组合物混合形成混合物；（b）加热混合物；以及（c）添加含有Ni和/或Pd的聚合催化剂。非烯烃链转移剂包括从H2、烷基硅烷、烷基烷氧基硅烷、烷基锗烷、烷基烷氧基锗烷、烷基锡烷和烷基烷氧基锡烷中选择的一种或多种化合物。活化剂的特征是具有pKa至少为5的活性氢。所得的多（环）烯烃聚合物可用于光刻胶组成物中。
• SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1679314A1

  公开（公告）日：2006-07-12

  A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided. The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10. The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

  本发明提供了一种适用于作为化学放大抗蚀剂的树脂成分的新型聚硅氧烷，该抗蚀剂具有特别优异的 I-D 偏压和焦深（DOF）等性能；一种可用作合成该聚硅氧烷的原料的新型硅烷化合物；以及一种包含该聚硅氧烷的辐射敏感树脂组合物。 硅烷化合物如下式（I）所示、 而聚硅氧烷具有下式（1）所示的结构单元、 其中 R 是烷基，R1 和 R2 分别代表氟原子、低级烷基或低级氟烷基，n 是 0 或 1，k 是 1 或 2，i 是 0 至 10 的整数。 辐射敏感树脂组合物包括聚硅氧烷和光酸发生器。
• Norbornene-type polymers, compositions thereof and lithographic processes using such compositions
  申请人：Promerus LLC

  公开号：EP2031007A2

  公开（公告）日：2009-03-04

  A top-coat composition comprising a non-self imageable polymer consisting of norbornene-type repeating units, said polymer comprising a first norbornene-type repeating unit represented by Formula I: where X is -CH2-, -CH2CH2-, O or S; n is an integer from 0 to 5 inclusive; each of R1 to R4 independently represents hydrogen, a linear or branched alkyl group, or a linear or branched haloalkyl group, subject to the proviso that at least one of R1 to R4 is a -QNHSO2R5 group where Q is a linear or branched alkyl spacer of 1 to 5 carbons, and R5 is a perhalo group of 1 to 10 carbon atoms, a solvent and optionally comprising one or more of a crosslinking agent, an acidic material or a surfactant.

  一种面漆组合物，包含一种由降冰片烯型重复单元组成的非自显影聚合物，所述聚合物包含由式 I 表示的第一降冰片烯型重复单元： 其中 X 是-CH2-、-CH2CH2-、O 或 S；n 是 0 至 5（包括 5）的整数；R1 至 R4 中的每一个都独立地代表氢、直链或支链烷基或直链或支链卤代烷基，但 R1 至 R4 中至少有一个是-QNHSO2R5 基团，其中 Q 是 1 至 5 个碳原子的直链或支链烷基间隔物，R5 是 1 至 10 个碳原子的全卤基团，溶剂，并可选择包含一种或多种交联剂、酸性物质或表面活性剂。