申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0553682A1
公开(公告)日:1993-08-04
A compound of the formula :
wherein
R¹is hydrogen, halogen, nitro, lower alkyl, lower alkoxy, amino or acylamino,
R², R³ and R⁴are each hydrogen, halogen, nitro, cyano, lower alkyl, lower alkenyl, lower alkylthio, mono or di or trihalo(lower)alkyl, oxo(lower)alkyl, hydroxy(lower)alkyl or optionally esterified carboxy; or
R² and R³are linked together to form 1,3-butadienylene,
R⁵is hydrogen or imino-protective group,
R⁶ and R⁷are each hydrogen or lower alkyl,
R⁸is hydrogen or lower alkyl which may have a substituent selected from the group consisting of halogen and lower alkoxy,
Ais lower alkylene,
Qis CH or N,
Xis N or CH,
Yis NH, O or S, and
Zis NH, S, SO₂ or O.
and pharmaceutically acceptable salt thereof, processes for their preparation and pharmaceutical compositions comprising them as an active ingredient.
式中的化合物:
式中
R¹为氢、卤素、硝基、低级烷基、低级烷氧基、氨基或酰氨基、
R²、R³ 和 R⁴ 各为氢、卤素、硝基、氰基、低级烷基、低级烯基、低级烷硫基、单或二或三卤代(低级)烷基、氧代(低级)烷基、羟基(低级)烷基或任选酯化的羧基;或
R² 和 R³ 连接在一起形成 1,3-丁二烯、
R⁵ 是氢或亚胺保护基、
R⁶ 和 R⁷ 均为氢或低级烷基、
R⁸为氢或低级烷基,可带有选自卤素和低级烷氧基的取代基、
A 是低级亚烷基、
Q 是 CH 或 N、
X是N或CH
Y 是 NH、O 或 S,以及
Z 是 NH、S、SO₂ 或 O。
及其药学上可接受的盐、其制备工艺和包含它们作为活性成分的药物组合物。